Tokyo Electron Limited

Olympus Corporation

Olympus Optical Company, Ltd.

Masakazu Higuma

Yasuyuki Futatsugi

Takao Yamaguchi

Takeaki Nakamura

Yasuhito Kura

Takahiro Kishi

Ichiro Nakamura

Yosuke Yoshimoto

Susumu Aono

Tadashi Aoto

Eiichiro Kikuchi

Yasuharu Sasaki

Kazutaka Nakatsuchi

Hidetoshi Saito

Yutaka Tatsuno

Jun Hiroya

Kimihiro Higuchi

Akira Kikuchi

Shinji Muto

A substrate mounting stage that prevents poor attraction of substrates so as to improve the operating rate of a substrate processing apparatus. The substrate mounting stage is disposed in the substrate processing apparatus and has a substrate mounting surface on which a substrate is mounted. The arithmetic average roughness (Ra) of the substrate mounting surface is not less than a first predetermined value, and the initial wear height (Rpk) of the substrate mounting surface is not more than a second predetermined value.

Substrate mounting stage and surface treatment method therefor

A structure, for use in a processing chamber of a plasma processing apparatus in which a plasma process is performed on a target substrate, includes a base member at least having a first surface and a second surface; and a thermally sprayed insulating film covering the first surface. Further, the structure includes an insulating protection member covering the second surface and made of a material having a linear expansion coefficient different from that of the base member; and an insulating layer interposed between the thermally sprayed insulating film and the insulating protection member to prevent a contact therebetween. The thermally sprayed insulating film, the insulating protection member and the insulating layer constitute an insulating surface covering the first surface and the second surface.

Plasma processing apparatus and structure therein

A surface processing method for a mounting stage, which enables a mounting surface conforming to a substrate to be formed while saving time and effort. The substrate is mounted on a mounting surface of the mounting stage disposed in a housing chamber of a substrate processing apparatus that carries out plasma processing on the substrate. The mounted substrate is thermally expanded.

Surface processing method for mounting stage

A surface treatment method that enables a surface of an electrostatic chuck to be smoothed, so as to improve the efficiency of heat transfer between the surface of the electrostatic chuck and a substrate. The electrostatic chuck is provided in an upper portion of a susceptor provided in a chamber of a substrate processing apparatus. In the surface treatment of the electrostatic chuck, a sprayed coating film is formed on the surface of the electrostatic chuck, next the surface of the electrostatic chuck is ground by bringing into contact therewith a grindstone, then the surface of the electrostatic chuck is ground flat by bringing into contact therewith a lapping plate onto a surface of which is sprayed a suspension, and then the surface of the electrostatic chuck is ground smooth by bringing into contact therewith a tape of a tape lapping apparatus.

Surface treatment method

An endoscope includes a first lens barrel having a brazing surface in at least a brazing portion thereof, and supporting an optical window member brazed thereon, and a second lens barrel arranged to be proximal with respect to the optical window member and supporting optical members on the inner circumference thereof. At least a distal end surface of one of the second lens barrel, a diaphragm member, a spacer ring, and the optical members has light reflectance lower than that of the brazing surface of the first lens barrel. At least the inner circumference of the second lens barrel has a light reflectance lower than that of the brazing surface of the first lens barrel or has a reflection surface more irregular than the brazing surface of the first lens barrel.

Endoscope

A cover glass frame as a second frame body mounting thereto a cover glass is fitted onto an objective lens frame, which is a first frame body mounting thereto a tip end lens and an objective lens as optical members, in a manner to be movable in a direction of optical axis, and is fixed after having been adjusted in position in the direction of optical axis. The objective lens frame and the cover glass frame thus fitted and fixed are fitted into and joined to a cylindrical member to constitute an imaging unit, which is then arranged in a tip end portion of an insertion part of an endoscope. Thereby, focus adjustment can be performed on the optical members, which are assembled into the imaging unit, and a tip end side portion of the insertion part of the endoscope can be made small in outer diameter to prevent entry of vapor into the imaging unit even when autoclave sterilization is carried out.

Endoscope device

An endoscope suitable for autoclave sterilization includes an insertion section having an objective lens section disposed at the extreme end thereof for focusing a subject image and an eyepiece section located on the base end side of the inserting section and including at least an eyepiece lens. an image guide fiber is disposed in the bundle for transmitting the subject image in an observation section focused by the objective lens section. An eyepiece lens unit is disposed in the eyepiece section, the eyepiece lens unit causing the eyepiece lens to confront the base end structure whose hermetic seal level is higher than the watertight seal level of the shell of the endoscope. A focus position changing means is disposed to the eyepiece lens unit to change the focus position of the eyepiece lens. The eyepiece section is so constructed and/or assembled that the autoclave sterilization process does not cause water vapor or the like to adversely affect the operability of the eyepiece section.

Endoscope suitable for autoclave sterilization

An endoscope capable of being autoclaved in accordance with the present invention includes an insertion unit, an internal endoscope space, and contents. The insertion unit has a soft member, which is made of a soft polymeric material, as at least part of a casing thereof. The internal endoscope space includes the internal space of the insertion unit that is formed at a first sealing level at which the internal space is sealed in a watertight manner relative to an outside. The contents include at least one hermetically sealed unit composed of a plurality of airtight partition members and formed at a second sealing level higher than the first sealing level by joining the meeting portions of the airtight partition members using an airtight joining material. All or part of the airtight partition members is stowed in the internal endoscope space. Even when high-pressure high-temperature steam permeates through the soft member of the insertion unit which is made of a polymeric material, and invades into the internal endoscope space formed at the first sealing level, the high-pressure high-temperature steam will be hindered from invading into the hermetically sealed unit included in the contents and formed at the second sealing level.

Endoscope capable of being autoclaved

An endoscope having resistance to high-temperature and high-pressure steam including an optical unit having at least one optical member; and optical unit supporting frame for supporting the optical unit so that its position can be adjusted in the direction of the optical axis; and a hermetic optical covering member joined to the optical unit supporting frame and having an optical window for covering at least an end portion of the optical unit when it is joined.

Growing community of inventors

Nirasaki, Japan

Masakazu Higuma