Canon Kabushiki Kaisha

Masakazu Harada

Kiyofumi Sakaguchi

Kazutaka Yanagita

Fumio Uehara

An ultrasonic bath ( ) is arranged below a wafer processing bath ( ). Wafers ( ) are processed while ultrasonic waves are transmitted from the ultrasonic bath ( ) to the wafer processing bath ( ). The wafers ( ) are processed while being entirely dipped into the wafer processing bath ( ) and rotated by wafer rotating rods ( ).

Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method

An ultrasonic bath (,) is arranged below a wafer processing bath (,). Wafers (,) are processed while ultrasonic waves are transmitted from the ultrasonic bath (,) to the wafer processing bath (,). The wafers (,) are processed while being entirely dipped into the wafer processing bath (,) and rotated by wafer rotating rods (,).

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Akiruno, Japan

Masakazu Harada