Tokyo Electron Limited

Masakazu Ban

Jun Yamashita

Cai Zhong Tian

Hideki Nagaoka

Kouki Suzuki

Atsushi Ueda

Sunao Muraoka

Taro Ikeda

Shigeru Kasai

In the microwave heating apparatus, four microwave introduction ports are arranged at positions spaced apart from each other at an angle of about 90&#xb0; in a ceiling portion of a processing chamber in such a way that the long sides and the short sides thereof are in parallel to inner surfaces of four sidewalls. The microwave introduction port are disposed in such a way that each of the microwave introduction ports are not overlapped with another microwave introduction port whose long sides are in parallel to the long sides of the corresponding microwave introduction port when the corresponding microwave introduction port is moved in translation in a direction perpendicular to the long sides thereof.

Microwave heating apparatus and processing method

A gate valve includes a plate-shaped valve element which is rectangular-shaped to suit the shape of an opening of a processing chamber and has a size larger than the opening. A hermetically sealing member to perform hermetic sealing by abutting on and being pressed against an outer side of the processing chamber is provided in the valve element. A microwave reflecting mechanism which is formed in a groove shape so as to surround a periphery of the hermetically sealing member is provided at an outer peripheral portion of the hermetically sealing member.

Microwave plasma processing device and gate valve for microwave plasma processing device

Liner for plasma processing apparatus

Growing community of inventors

Nirasaki, Japan

Masakazu Ban