Tokyo Ohka Kogyo Co., Ltd.

Toyko Ohka Kogyo Co., Ltd.

Tokyo Ohka Kogyo., Ltd.

Masahito Yahagi

Takahiro Kojima

Yoichi Hori

Tatsuya Fujii

Hitoshi Yamano

Tasuku Matsumiya

Yasuhiro Yoshii

Takashi Kamizono

Issei Suzuki

Yuki Fukumura

Kenta Suzuki

Tsuyoshi Kurosawa

Toshikazu Takayama

Kazufumi Sato

Ken Miyagi

Taku Hirayama

Jun Iwashita

Yuta Iwasawa

Koshi Onishi

Hiroto Yamazaki

Yosuke Suzuki

Daiju Shiono

Masatoshi Arai

Akiya Kawaue

Yoshitaka Komuro

Masaru Takeshita

Takayoshi Mori

Takaya Maehashi

Daisuke Kawana

Tomoya Kumagai

Ryoji Watanabe

Shogo Matsumaru

Kazuaki Ebisawa

Katsumi Ohmori

Kenri Konno

Mitsuo Hagihara

Isamu Takagi

A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formulae (a0-1) and one or more compounds selected from the group consisting of a compound (B01) represented by General Formula (b0-1) and a compound (B02) represented by General Formula (b0-2), Wrepresents a polymerizable group-containing group, Yarepresents a single bond or the like, Rxrepresents an acid dissociable group, Rand Rrepresents an aryl group having a fluorine atom, R, R, and Rrepresents an aryl group or the like which may have a substituent, and Xand Xrepresents a counter anion

Resist composition and method of forming resist pattern

A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1) and containing a compound (D0) represented by General Formula (d0), Wrepresents a polymerizable group-containing group, Yarepresents a single bond or the like, Rxrepresents an acid dissociable group, Mrepresents an m-valent organic cation, and Rrepresents a substituent

A resist composition containing a silicon-containing resin, an acid generator component which generates an acid upon exposure, and a photodecomposable base which controls diffusion of the acid generated from the acid generator component upon exposure, in which the silicon content proportion in the silicon-containing resin is in a range of 20% to 25% with respect to a total amount of all atoms constituting the silicon-containing resin.

A resist composition including a compound (D0) represented by general formula (d0) and a polymeric compound (A10) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below (in formula (d0), n represents an integer of 2 or more; in formula (a0-1), Wrepresents a polymerizable group-containing group; Crepresents a tertiary carbon atom, and the &#x3b1;-position of Cis a carbon atom which constitutes a carbon-carbon unsaturated bond; Rrepresents an aromatic hydrocarbon group which may have a substituent, or a chain hydrocarbon group; Rand Reach independently represents a chain hydrocarbon group, or Rand Rare mutually bonded to form a cyclic group

A resist composition including a resin component (A1) having a structural unit (a01), a structural unit (a02) and a structural unit (a03) derived from compounds represented by general formulae (a01-1), (a02-1) and (a03-1), respectively (Wrepresents a polymerizable group-containing group containing no oxygen; Wrepresents a polymerizable group-containing group containing oxygen; Wrepresents a polymerizable group-containing group which may contain oxygen; Waand Warepresent an aromatic hydrocarbon group; Xarepresents a group which forms an alicyclic hydrocarbon group together with Ya; Rarepresents a hydrocarbon group which may have a substituent) 

A resist composition including a compound (D0) represented by general formula (d0) and a resin component (A1) has a structural unit (a0) in which a compound represented by general formula (a0-1) has a polymerizable group within the Wportion converted into a main chain (in formula (d0), Rdrepresents a fluorine atom or a fluorinated alkyl group; In formula (a0-1), Wrepresents a polymerizable group-containing group; Crepresents a tertiary carbon atom, and the &#x3b1;-position of Cis a carbon atom which constitutes a carbon-carbon unsaturated bond; Rrepresents an aromatic hydrocarbon group; or a chain hydrocarbon group; Rand Reach independently represents a chain hydrocarbon group, or Rand Rare mutually bonded to form a cyclic group). 

A resist composition including a resin component whose solubility in a developing solution is changed due to the action of the acid, in which the resin component has a constitutional unit derived from a compound represented by Formula (a0-1) and a constitutional unit containing an acid decomposable group whose polarity is increased due to the action of the acid. In the formula, W represents a polymerizable group-containing group, Yarepresents a carbon atom, Xarepresents a group that forms a monocyclic aliphatic hydrocarbon group together with Ya, some or all hydrogen atoms in the monocyclic aliphatic hydrocarbon group may be substituted with substituents, and Rarepresents an aromatic hydrocarbon group which may have a substituent. 

A resist composition including a polymeric compound having a structural unit in which a compound represented by formula (a0-1) has a polymerizable group within the Wportion converted into a main chain, and a compound represented by formula (b1-1) in which Wrepresents a polymerizable group-containing group; Crepresents a tertiary carbon atom, and the &#x3b1;-position of Cis a carbon atom which constitutes a carbon-carbon unsaturated bond; Rrepresents an aromatic hydrocarbon group or a chain hydrocarbon group; Rand Rare mutually bonded to form a 5-membered aliphatic monocyclic group, or a condensed polycyclic hydrocarbon group containing a 5-membered aliphatic monocyclic ring; Rrepresents a cyclic group; R, Rand Reach independently represents a substituent; nrepresents an integer of 0 to 4; nrepresents an integer of 0 to 5; nrepresents an integer of 0 to 5; and Xrepresents a counteranion. 

A resist composition including a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), and a resin component (A1) which has a constitutional unit (a0) obtained from a compound represented by Formula (a0-1), in which a polymerizable group at a W portion is converted into a main chain, and a constitutional unit (a1) containing an acid decomposable group whose polarity is increased due to an action of an acid. In Formula (d0), Rrepresents a substituent and n represents an integer of 2 or greater. In Formula (a0-1), Warepresents an (n+1)-valent aromatic hydrocarbon group which may have a substituent. 

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group, Vais a divalent hydrocarbon group, nrepresents an integer of 0 to 2, Yais a carbon atom, Xais a group forming a monocyclic aliphatic hydrocarbon group together with Ya, and Rais an aromatic hydrocarbon group or a specific unsaturated hydrocarbon group. In general formula (b1), Rrepresents a cyclic hydrocarbon group, Yrepresents a divalent linking group containing an ester bond, Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond, and Mis an m-valent organic cation. 

Resist composition and method for forming resist pattern

A resist composition including a resin component whose solubility in a developing solution is changed due to an action of an acid, in which the resin composition has a constitutional unit derived from a compound containing a chain-like aliphatic acid dissociable group or a monocyclic aliphatic acid dissociable group and a constitutional unit derived from a compound containing an aromatic hydrocarbon group-containing acid dissociable group.

A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including a polymer compound (A1) which has a constitutional unit (a0) derived from a compound represented by Formula (a0-1) and a constitutional unit (a10) derived from a compound represented by Formula (a10-1) and does not have a constitutional unit represented by Formula (1). In the formulas, Raand Rarepresent a polymerizable group-containing group; Waand Warepresent an (n+1)-valent or (n+1)-valent aromatic hydrocarbon group; nand nrepresent an integer of 1 to 3; and Zrepresents Fe, Co, Ni, Cr, or Ru. 

Resist composition, method of forming resist pattern, and polymer compound

A resist composition including a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1), an onium salt having an anion moiety with a specific structure, and a photodecomposable base which is decomposed upon exposure and then loses the ability of controlling of acid diffusion. In formula (a0-1), Rarepresents a polymerizable group-containing group; Warepresents an aromatic hydrocarbon group having a valency of (n+1), provided that Raand Wamay together form a condensed ring structure; nrepresents an integer of 1 to 3; Yarepresents a carbonyl group or a single bond; Rarepresents a hydrogen atom or a hydrocarbon group which may have a substituent. 

A resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the developing solution changes under the action of an acid and an acid generator represented by general formula (b1). In general formula (b-1), Rrepresents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent, Yrepresents a divalent linking group containing an ester bond (&#x2014;C(&#x2550;O)&#x2014;O&#x2014; or &#x2014;O&#x2014;C(&#x2550;O)&#x2014;), Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond, m is an integer of 1 or more, and Mrepresents an m-valent organic cation.R&#x2014;Y&#x2014;V&#x2014;CF&#x2014;SO(M)&#x2003;&#x2003;(b1)

Resist composition, method for forming resist pattern, compound, and acid generator

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Vais a divalent hydrocarbon group. nrepresents an integer of 0 to 2. Ra'and Ra&#x2032;are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra&#x2032;is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), Rrepresents a cyclic hydrocarbon group. Yrepresents a divalent linking group containing an ester bond. Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and Mis an m-valent organic cation. 

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Masahito Yahagi