Advanced Energy Industries, Inc.

Buhler Ag

Aes Global Holdings Pte Ltd.

Masahiro Watanabe

Corneluis Erasmus Van Greunen

Ken Nauman

Michael S Thornton

Michael Meyer

Sarah Williams

An apparatus comprises a vacuum chamber configured to produce a substantially atmospheric vacuum environment for plasma processing; a radio frequency (RF) power supply located outside of the vacuum chamber; an RF matching network operatively coupled to the RF power supply; and a plurality of electrodes mounted within the vacuum chamber, the plurality of electrodes configured to receive RF power signals from the RF power supply through the RF matching network. The RF power signals are simultaneously delivered to the plurality of electrodes during a sputtering operation. The plurality of electrodes and a set of electrical components are operative to manage the inductive and capacitive reactance for coupling the RF power signals to provide more desirable plasma coupling during the sputtering operation.

RF sputtering of multiple electrodes with optimized plasma coupling through the implementation of capacitive and inductive components

Systems and methods for operating a match network are disclosed. One match network comprises at least one first sensor to measure one or more first parameters and at least one second sensor to measure one or more second parameters. The match network also comprises means for assessing whether the match is operating as expected or operating outside of specifications using the one or more first-parameter measurements; the one or more second-parameter measurements; a setting of the match; or one or more expected parameter values.

Assessment of matching networks

Systems and methods for operating a match network are disclosed. A method includes obtaining at least one measurement-based-attribute at the first side of a match network and at least one measurement-based-attribute at a second side of the match network. A present reactance setting of the match network is obtained and a model of the match network is accessed that associates the at least one measurement-based-attribute at the first side of the match network with at least one expected-attribute at the second side of the match network based upon the present reactance setting of the match network. The at least one measurement-based-attribute at the second side of the match network is contrasted with the at least one expected-output-attribute to assess whether the match network is at least one of damaged or operating outside of specifications.

Detection of damage in matching networks

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Windsor, CO, United States of America

Masahiro Watanabe