Fujitsu Corporation

Masahiro Uraguchi

Kazuhiko Sumi

Ryuji Maeda

Mitsugu Uemura

Yusei Miyazono

Keiji Watanabe

Ei Yano

Koji Nozaki

Miwa Kozawa

Takahisa Namiki

Junichi Kon

Eiichi Hoshino

Toshikatsu Minagawa

Yuichi Yamamoto

A substrate with striped ridge patterns formed on the surface thereof is transported along a transport path. A relationship is determined between the direction of the striped ridge patterns on the substrate surface and the direction of jetting out fluid to the substrate surface. The fluid is jetted out and blown to the substrate surface along the direction satisfying the determined relationship to process the surface of the substrate. It is possible to reliably perform a surface process of each substrate irrespective of different directions of striped ridge patterns on substrate surfaces.

Method and apparatus for processing substrate surface with striped ridge patterns

A resist composition comprising, in a resist, an additive which has a melting point-of 160&deg; C. or above, contains no aromatic ring, has a molecular size of no greater than 50 &angst; and is soluble in the developing solution for the resist, at 1-50 parts by weight with respect to 100 parts by solid weight of the resist, as well as a pattern forming process employing it. It thereby becomes possible to obtain high-resolution resist patterns.

Resist composition and pattern forming process

An exposure process of a pattern on a transparent substrate of a plasma display panel is conducted on a flat principal surface of stage in which a depression is formed for accommodating an alignment optical source, wherein a movable shutter is provided on the stage so as to be movable in a plane substantially flush to the principal surface of the stage.

Method of fabricating a flat-panel display device and an apparatus

A resist developing apparatus has a plurality of developing solution containers each provided with a temperature regulator, a mixture tank connected to the plurality of developing solution containers, a flow control valve connected between the mixture tank and each developing solution container, a temperature detector for detecting the temperature of developing solution in the mixture tank, and a control system for controlling the flow control valve in accordance with the temperature detected by the temperature detector. As the development progresses, the temperature of the developing solution is lowered to stop the development. Thereafter, the developing solution is supplanted by rinsing solution.

Method and apparatus for developing resist

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Kawasaki, Japan

Masahiro Uraguchi