Hitachi-High-Technologies Corporation

Masahiro Tsunoda

Katsuya Kawakami

Takashi Gunji

Masashi Fujita

Katsunori Onuki

Hidetoshi Sato

Seiichi Shindo

Kouki Miyahara

Takaaki Nishimori

Katsuya Aibara

An object of the present invention is to provide a charged particle beam device that suppresses the influence of an external electromagnetic wave, even when a shielding member, such as a vacuum valve, is in the open state. To achieve the above object, a charged particle beam device including a vacuum chamber () having an opening () that surrounds a sample delivery path is proposed. The charged particle beam device includes a conductive material () surrounding the opening () for conduction between the vacuum chamber () and a conductive member () disposed on the atmosphere side. According to an embodiment of the present invention, it is possible to restrict an electromagnetic wave () from reaching the sample chamber via the delivery path.

Conductive interface system between vacuum chambers in a charged particle beam device

A sample conveying mechanism minimizes a risk of damage to a sample typified particularly by a photomask, and the sample conveying mechanism provides the sample retention mechanism for holding the sample so as to be suspended and is configured such that a portion close to a pattern surface of the sample is separated from a projection section of a flange for suspending the sample, thereby inhibiting a contact between the pattern surface and members configuring the conveying mechanism.

Sample conveying mechanism

A charged particle beam system for measuring a sample such as a photomask is provided. The system is capable of adjusting its condition with high accuracy to measure the sample even when a back surface of the sample is charged. The charged particle beam system measures an electric potential distribution on the back surface of the sample during a process for transporting the sample. The system controls the degree of charge neutralization of the sample based on the result of the measurement, or estimates or calculates an electric potential distribution appearing on a front surface of the sample and obtained when the sample is placed on the sample holder or the like. The system is capable of measuring or inspecting the sample such as a photomask at high speed and with high accuracy even when the sample has a large amount of charges accumulated on its surface different from its pattern surface.

Method for measuring electric potential distribution on a surface of a sample, and charged particle beam system

Growing community of inventors

Hitachinaka, Japan

Masahiro Tsunoda