Canon Kabushiki Kaisha

Hitachi Displays, Ltd.

Masahiro Tamura

Takuro Yamazaki

Nobuhiko Sato

Naoki Tokuda

Masami Iseki

Kouji Ikeda

Philip D Schumaker

Ken-ichiro Shinoda

Junya Tamaki

Zenichi Hamaya

Yeshwanth Srinivasan

Takeshi Izumida

Yoshinari Someya

The present invention provides an imprint method that performs a process of forming a pattern of an imprint material on a substrate using a mold, for each of a plurality of shot regions on the substrate, the process including: dispensing the imprint material onto the substrate; moving, to below the mold, the substrate on which the imprint material is dispensed; and supplying, in a moving path of the substrate in the moving, a first gas that promotes filling of the imprint material into a pattern of the mold, wherein in a case where a target shot region to be subjected to the process meets a predetermined condition, supplying a second gas having a lower oxygen concentration than air onto the substrate is additionally executed for the target shot region after the supplying the first gas.

Imprint method, imprint apparatus, and method of manufacturing article

An imprint apparatus includes a mold holder for holding a mold, a substrate holder for holding a substrate, a dispenser for arranging imprint material on the substrate, and a scope for capturing an image of a mark. The substrate holder includes a reference plate having a reference mark whose image is captured by the scope, the dispenser is arranged in a first direction when viewed from the mold holder, and the reference plate is arranged between a virtual straight line which is parallel to a second direction perpendicular to the first direction when viewed from the mold holder and passes through a center of the substrate holder, and an edge of the substrate holder located in the first direction when viewed from the virtual straight line.

Imprint apparatus, imprint method, and article manufacturing method

There is provided a method for use in molding an imprint material supplied onto a substrate with a mold to form a pattern on the substrate, the method comprising steps of: with respect to each of regions obtained by dividing a region of the mold based on information of a pattern of the mold, obtaining first information of a first arrangement pattern of the imprint material based on information of the pattern of the mold; obtaining second information of a second arrangement pattern of the imprint material based on information of a thickness of a residual layer of the pattern to be formed on the substrate; and obtaining third information of a third arrangement pattern of the imprint material to be arranged on the substrate based on the first information and the second information.

Imprint method, imprint apparatus, program, and article manufacturing method

The present invention provides an imprint apparatus which forms a pattern on a substrate by molding an imprint material on the substrate using a mold, comprising a supply unit configured to supply droplets of the imprint material onto the substrate; and a processing unit configured to acquire arrangement patterns of the droplets on the substrate, wherein based on the arrangement pattern corresponding to a first portion of the mold and the arrangement pattern corresponding to a second portion of the mold, the processing unit acquires the arrangement pattern corresponding to a boundary portion between the first portion and the second portion.

Imprint apparatus, imprint method, and method of manufacturing article

An organic EL displaying apparatus which suppresses a defective display caused by a leak current at a time when an emission period controlling transistor is off is provided. The organic EL displaying apparatus comprises a plurality of pixels each of which includes an organic EL element, a power supply line, a driving transistor and the emission period controlling transistor, a data line, and a control line. In this apparatus, in a certain one of the pixels, a resistance RILM between source and drain electrodes of the emission period controlling transistor in an off state of the emission period controlling transistor, and a resistance RDr between source and drain electrodes of the driving transistor in a state that a minimum gradation displaying data voltage has been applied to a gate electrode of the driving transistor satisfy RILM&#x2267;RDr.

Organic electroluminescence displaying apparatus which suppresses a defective display caused by a leak current at a time when an emission period controlling transistor is off

Provided is a crystalline silicon thin film semiconductor device which is capable of reducing off-state leakage current and has excellent current rising characteristics. The thin film transistor includes a semiconductor layer formed of an amorphous silicon layer and a crystalline silicon layer. A drain electrode is provided in direct contact with the crystalline silicon layer of the semiconductor layer, to thereby improve the current rising characteristics.

Growing community of inventors

Utsunomiya, Japan

Masahiro Tamura