Sinfonia Technology Co., Ltd.

Masahiro Osawa

Toshihiro Kawai

Mitsuo Natsume

Mitsutoshi Ochiai

Toshimitsu Morihana

An EFEM includes a housing having a substantially closed substrate transfer space in the housing and a control part configured to perform a control of supplying an inert gas into at least the housing. The control part includes an inert gas total supply amount setting part configured to set a total supply amount of the inert gas to be supplied into the housing; a door open/purge determination part configured to determine whether a container door of a substrate storage container is in an open state and whether a purge device is performing a purge process; and an in-housing inert gas supply amount calculation part configured to calculate a supply amount of the inert gas to be supplied into the housing. The supply amount of the inert gas to be supplied into the housing is determined according to an inert gas supply amount command value determined based on a calculation result.

EFEM and method of controlling supply amount of inert gas

The left-right span between a light projection sectionand a light receiving sectionof a mapping sensorhaving an optical axis Lextending in a left-right horizontal direction is arranged to be narrower than the span of a front opening of a open cassettewhich is a smaller one of differently-sized containers conveyed to a load port, and the mapping sensor is attached to a mapping device. A first protrusion sensorhaving an optical axis Lextending in the left-right horizontal direction is attached to the mapping deviceto be separated from the mapping sensorin a moving direction of the mapping sensor. Furthermore, a second protrusion sensorhaving an optical axis extending in the up-down moving direction of the mapping sensoris provided.

Growing community of inventors

Minato-ku, Japan

Masahiro Osawa