Dainippon Screen Mfg. Co., Ltd.

Screen Holdings Co., Ltd.

Masahiro Nonomura

Akihiko Morita

Kazuki Nakamura

Junichi Ishii

Masaru Kitagawa

Katsunori Tanaka

Fumitake Mieno

Naoko Onodera

A control device is provided which, at a time of upper surface treatment for treating an upper surface of a substrate with a treating device, supplies a treating liquid from a treating liquid supply source and operates a first control valve to supply a gas at a first flow rate from a gas nozzle, while operating a rotary drive device to spin the substrate at a first rotational frequency, and at a time of drying treatment, after completion of the upper surface treatment, for drying the substrate by increasing the rotational frequency of the rotary drive device to spin the substrate at a second rotational frequency, operates the first control valve and second control valve to supply the gas at a higher flow rate than the first flow rate from the gas nozzle.

Substrate treating apparatus and substrate treating method

An inventive substrate treatment apparatus includes a substrate rotation unit which rotates a substrate, a brush to be brought into contact with at least a peripheral edge portion of a front surface of the substrate rotated by the substrate rotation unit, and a peripheral rinse liquid ejection unit which ejects a rinse liquid toward a predetermined rinse liquid applying position on the peripheral edge portion of the front surface of the substrate from a position located radially inward of the predetermined rinse liquid applying position with respect to a rotation radius of the substrate, the predetermined rinse liquid applying position being spaced downstream in a substrate rotation direction from a brush contact area of the peripheral edge portion kept in contact with the brush.

Subtrate treatment apparatus

A method and apparatus for storing a brush body, made of a hydrophilic sponge-like porous material in a readily usable condition employs a substrate cleaning brush stored in a vessel, which vessel is filled with liquid such that the brush body is submerged in the liquid.

Method and vessel for storing a substrate cleaning brush

A substrate holder for use in a substrate spin treating apparatus carries out a desired treatment of a substrate by supplying treating liquid to a surface of the substrate while spinning the substrate. The substrate holder includes a turntable rotatable in a horizontal plane and a motor for rotating the turntable. Support pins are arranged on the turntable for supporting the substrate in a horizontal posture above and spaced from a surface of the turntable. A vertically movable disk of a size at least corresponding to the substrate is disposed between the turntable and the substrate being supported by the support pins. A raising and lowering device is provided for lowering the vertically movable disk to a lower position adjacent the turntable when the turntable is at rest, and raising the vertically movable disk to an upper position adjacent a substrate on the support pins when the turntable is in rotation to effect the treatment.

Growing community of inventors

Kyoto, Japan

Masahiro Nonomura