Shin-Etsu Quartz Products Co., Ltd.

Nippon Aspherical Lens Co., Ltd.

Opto-Electronics Laboratory, Inc.

Masahiro Nakatsuka

Akira Fujinoki

Hiroyuki Nishimura

Tetsuji Ueda

Takahisa Jitsuno

Keiu Tokumura

Nobuaki Nakashima

Michinari Ohuchi

Hidetsugu Yoshida

It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

Copper-containing silica glass, method for producing the same, and xenon flash lamp using the same

The invention counterbalances the defects of optical glass and optical plastic so as to realize a high precision aspherical processing. The optical lens 1 includes a matrix 2 of optical glass and a coating of optical resin material applied to the surface of the matrix 2. A reflective wavefront of a lens plane 4 of the optical lens 1 is measured by means of a interferometer 5. The wavefront from the interferometer 5 is monitored by a computer system 7 to provide monitoring information. The lens plane 4 is irradiated or scanned with a short wavelength, ultraviolet laser beam L in accordance with the monitoring information, whereby the lens plane 4 is processed with the ultraviolet laser beam in non-contact manner into a shape to provide a most appropriate reflective wavefront.

Method and apparatus for forming an optical surface by optical etching

Growing community of inventors

Ikoma, Japan

Masahiro Nakatsuka