Sakai Display Products Corporation

House Foods Group Inc.

Cerebrex, Inc.

Az Electronic Materials (luxembourg) S.a.r.l.

Masahiro Kato

Shinya Suzuki

Noriya Masamura

Kenzo Konishi

Nobutake Nodera

Daishi Yokoyama

Takao Matsumoto

Katsuto Taniguchi

Takashi Fuke

Satoru Utsugi

Shinsuke Imai

Jinji Shono

Shinji Koiwa

Akihiro Shinozuka

Seisuke Morioka

Masae Ueyama

Yasuhiro Kamata

Hideo Nagano

The present invention provides a means for accurately discriminating whether an onion is an onion with no pungent taste and/or tear-inducing property. The present invention relates to a method of discriminating traits of an onion, comprising a first determination step of determining presence of the nucleotide sequence of SEQ ID NO:1 corresponding to alliinase gene 1 in a nucleic acid derived from the onion, and a second determination step of determining presence of the nucleotide sequence of SEQ ID NO:2 corresponding to alliinase gene 2, wherein the onion is discriminated to be an onion with no pungent taste and/or tear-inducing property if the presence of the nucleotide sequence of SEQ ID NO:1 is not determined in the first determination step and the presence of the nucleotide sequence of SEQ ID NO:2 is determined in the second determination step.

Onion discrimination method

The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring. The interlayer insulating film is formed using the positive type photosensitive siloxane composition without using a resist.

Positive type photosensitive siloxane composition, active matrix substrate, display apparatus, and method of manufacturing active matrix substrate

There is provided a manufacturing method for a thin-film transistor substrate, which enables to excellently perform alignment between an annealed region of a semiconductor film and a mask pattern of a conductive film. The method comprises annealing a semiconductor film being formed on a gate insulation film covering a gate electrode with a laser beam by using a mask, the gate electrode being formed within a thin-film transistor substrate region on a substrate; forming a first alignment mark outside the thin-film transistor substrate region on the substrate, by irradiating the substrate through the mask with the laser beam; patterning the semiconductor film; forming a conductive film on the semiconductor film; positioning a photomask on the basis of the first alignment mark; and forming a source electrode and a drain electrode by patterning the conductive film through the photomask; wherein the first alignment mark is formed while annealing the semiconductor film.

Method for manufacturing thin film transistor substrate

This invention provides an onion exhibiting very weak or no pungency and a method for producing such onion. In such onion, alliinase gene expression is reduced.

Onion with reduced pungency that does not generate lachrymatory component

Provided is a manufacturing method for an active matrix substrate, capable of providing a hole for alignment at an interlayer dielectric film without possible etching of a substrate surface and abnormal electric discharge and of allowing the position of a formed film to be easily corrected to be aligned with the position of the film of the lowest layer, with high overlaying precision. Also provided are the active matrix substrate and a display apparatus comprising the active matrix substrate. An interlayer dielectric filmof the active matrix substrate is formed using an SOG material with photosensitivity, and an adjustment holefor adjustment of the patterns of a gate insulation film, a first semiconductor film, a second semiconductor filmand a source metal that are formed on the upper side of a substrateand the interlayer dielectric filmis formed. The position of each film is adjusted while viewing an edge of the gate wiringthrough the adjustment hole

Manufacturing method for active matrix substrate, active matrix substrate and display apparatus

A data reception device includes: an equalizer circuit that shapes a waveform of an input signal according to a set gain value; a CDR circuit which recovers a plurality of clock signals having different phases in one cycle from the input signal after being subjected to the waveform shaping performed by the equalizer circuit; an oversampler which performs sampling of the waveform-shaped input signal in synchronization with the plurality of clock signals and recovers a plurality of input data from the waveform-shaped input signal; and a calibration control unit which determines whether the oversampler correctly recovers the input data based on a result of the sampling performed by the oversampler, and generates a control signal to set the gain value of the equalizer circuit based on a determination result when it is determined that the input data is not correctly recovered.

Data reception device

A display device () includes a processor () that outputs drawing data and a timing controller () that outputs the drawing data input from the processor according to horizontal synchronization and vertical synchronization. When a still image region where drawing data has not been updated compared with a previous frame and a moving image region where drawing data has been updated compared with a previous frame are included in one frame, the processor transmits data update information, which is for specifying the position of the moving image region or a line including the moving image region, to the timing controller temporally earlier than drawing data of the line including the moving image region. The timing controller performs processing for lowering the frame rate of the still image region or processing for thinning out some of image lines of the still image region based on the data update information.

Low power consumption display device

On a photomask used for exposure processing, a plurality of pattern regions on which predetermined patterns are formed using a light shielding material are provided, and calibration marks are formed at positions corresponding to at least two opposite sides of each pattern region. During exposure processing, a deformation state of the photomask is detected based on calibration marks formed on the photomask and marks formed on a substrate stage, and a projection condition for projecting a pattern formed on the photomask on the substrate is corrected based on the detection result.

Growing community of inventors

Osaka, Japan

Masahiro Kato