Mitsubishi Denki Kabushiki Kaisha

Kabushiki Kaisha Machida Seisakusho

Tokyo Electron Limited

Gigaphoton Inc.

Topcon Corporation

Daiichi Sankyo Company, Limited

Ebara Corporation

Kabushiki Kaisha Topcon

Konami Digital Entertainment Co., Ltd.

Mitsubishi Heavy Industries Machinery Systems, Ltd.

Machida Endoscope Co., Ltd.

Mitsbuishi Denki Kabushiki Kaisha

Gigaphton Inc.

J-oil Mills, Inc.

Masahiro Inoue

Kouji Kakizaki

Takanobu Ishihara

Chishio Koshimizu

Makoto Ono

Takeshi Murakami

Shinji Nagai

Noriyuki Kushiro

Kunihiko Miyagi

Hiroshi Sobukawa

Tsutomu Nagata

Gen Tamamushi

Yoshiji Minagawa

Kengo Noguchi

Takashi Kametani

Nobuo Koshikawa

Yuka Ashida

Osamu Wakabayashi

Masaru Nakamura

Koji Matsumoto

Takayuki Yabu

Hakaru Mizoguchi

Takeshi Honda

Masahiro Yamamoto

Hideo Hoshino

Mitsunori Ohata

Masao Yoshida

Shoichiro Matsuyama

Shinichi Okada

Yoshiyuki Honda

Hirotami Koike

Narihiro Toda

Ken Kobayashi

Youichi Sasaki

Akira Higuchi

Mitsunobu Esaki

Rieko Takano

Yohei Kojima

Ryutaro Nakashima

Naozo Sugimoto

Sumio Sasaki

Kazuhiro Maruyama

Kazuho Uemura

Toshihiko Nishizaki

Masuo Amma

Rieko Iwatsubo

Rieko Yoshikawa

Yuto Kosaka

Takahiro Tokuchi

Bongseong Kim

A plasma processing apparatus includes a plasma processing chamber, a substrate support, a source RF generator, and a bias RF generator. The substrate support is disposed within the plasma processing chamber. The source RF generator is configured to generate a source RF signal. The source RF signal includes source cycles, and each of the source cycles includes a source ON state and a source OFF state. The source ON state has at least two source power levels. The bias RF generator is coupled to the substrate support and configured to generate a bias RF signal. The bias RF signal includes bias cycles corresponding to the source cycles, respectively. Each of the bias cycles includes a bias ON state and a bias OFF state. The bias ON state has at least two bias power levels.

Plasma processing apparatus

A plasma processing apparatus includes: a chamber; a substrate support provided in the chamber; a bias power supply that supplies an electrical bias energy to an electrode of the substrate support; a matching box including a matching circuit; a radio-frequency power supply that supplies a radio-frequency power having a variable frequency into the chamber through the matching box, and adjusts the frequency of the radio-frequency power in each of a plurality of phase periods within the cycle of the electrical bias energy; a sensor that detects an electrical signal reflecting a deviation of a load impedance of the radio-frequency power supply from a matching state; and a filter that generates a filtered signal by removing and an intermodulation distortion component of the radio-frequency power and the electrical bias energy from the electrical signal in each of the plurality of phase periods.

Plasma processing apparatus and processing method

An apparatus, method, and non-transitory computer-readable medium reduces the power level of a reflected wave from a load coupled to a radio-frequency power supply. A plasma processing apparatus includes a chamber, a substrate support, a radio-frequency power supply, a bias power supply, and a controller. The bias power supply periodically applies a pulsed negative voltage to the substrate support. The controller controls the radio-frequency power supply to provide radio-frequency power with a changed frequency within a period in which the pulsed negative voltage is applied from the bias power supply to the substrate support, to reduce a power level of a reflected wave from a load that is coupled to the radio-frequency power supply.

Plasma processing apparatus and plasma processing method

A focusing adjustment unit changes a relative positions of an optical system and an element of a camera the imaging direction of which faces a predetermined target shooting position from a first side to a second side in an imaging direction. Each time the focusing adjustment unit changes the relative position of the optical system and the element, an evaluation unit calculates an evaluation score monotonically increasing relative to a standard deviation in an adjustment range of an image captured by the camera, the adjustment range being such that an adjustment member a pattern of a plurality of colors provided at the target shooting position comes out. A focusing position determination unit determines a focusing position of the camera based on a change of the evaluation score calculated by the evaluation unit.

Focusing position adjustment device, focusing position adjustment system, program, and focusing position adjustment method

There is provided an X-ray nondestructive testing device which irradiates X-rays to an article, the article including a substrate having a predetermined X-ray absorption coefficient and a measurement target object disposed therein and having another X-ray absorption coefficient differing from that of the substrate, the device including: an X-ray source configured to irradiate the X-rays to the article; a detector configured to detect the transmission amounts of the X-rays passed through the article at at least paired different locations; a detection position specifying designator configured to specify the paired different locations as a set of paired locations based on a pre-stored design information; a driving mechanism configured to move the detector to the set of paired locations; and an operation calculator configured to calculate the thickness of the measurement target object based on the transmission amounts of the X-rays detected by the detector.

X-ray nondestructive testing device

A compound represented by the following general formula (I) or a pharmacologically acceptable salt thereof, wherein A represents a C3 to C12 cycloalkyl group which may be substituted by one to three selected from a fluoro group, a hydroxy group, a C1 to C6 alkyl group, etc; R, R, and Reach independently represent a hydrogen atom, a fluoro group, or a C1 to C6 alkyl group; Rrepresents a hydrogen atom or a prodrug group; and Y represents &#x2014;CH&#x2014;CHR&#x2014;CH&#x2014;NHR(wherein Rrepresents a hydrogen atom, a C1 to C6 alkyl group, or a C1 to C6 alkoxy group, and Rrepresents a hydrogen atom or a prodrug group), or the like exhibits excellent TAFIa inhibitory activity and is useful as a therapeutic drug for myocardial infarction, angina pectoris, acute coronary syndrome, cerebral infarction, deep vein thrombosis, pulmonary embolism, and the like.

Cycloalkyl-substituted imidazole derivative

A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal.

Droplet generation and detection device, and droplet control device

A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.

Target output device and extreme ultraviolet light source apparatus

An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.

Extreme ultraviolet light source apparatus

To find a therapeutic agent and/or a preventive agent for diabetes mellitus or the like having excellent activity and safety. A compound represented by the following general formula (I), or a pharmacologically acceptable salt thereof. In the formula, X represents &#x2550;C(R5)- or &#x2550;N&#x2014;; Y represents &#x2014;O&#x2014; or &#x2014;NH&#x2014;; L represents a bond or a substitutable C1-C3 alkylene group; M represents a substitutable C3-C10 cycloalkyl group, a substitutable C6-C10 aryl group, or a substitutable heterocyclic group; Rrepresents a C1-C6 alkyl group, a C3-C10 cycloalkyl group, a C1-C6 haloalkyl group, a C2-C6 alkenyl group, a C2-C6 alkynyl group, a C1-C6 aliphatic acyl group, a C1-C6 alkoxy C1-C6 alkyl group, or a C6-C10 aryl group; and R, R, R, and Rmay be the same or different and each represent a hydrogen atom, a halogen atom, a C1-C3 alkyl group, a C1-C3 haloalkyl group, a C1-C3 alkoxy group, or a nitro group. In this connection, the alkyl group moieties of Rand Rmay be bonded to each other to form a 5- to 6-membered heterocyclic ring containing one oxygen atom. 

Carboxylic acid compound

To provide a game system that makes players' play order comply with a predetermined rule but nevertheless allows, with appropriate measure, any delaying player to join the game, each terminal device constituting the system stores in a storage unit game's stage/delay information regarding all players including players operating other terminal devices, a stage updating unit updates the storage unit based on an operation entry accepted by an operation entry unit from an owner player as a play determining unit determines that the owner player's turn has come, and an operation entry received by an operation receiving unit from any other terminal device, and a delay updating unit updates the storage unit when an abort entry unit accepts an abort entry from the player or an abort notification is received, or updates delay information when stage information is updated.

Game system, game control method, information recording medium, and program

An electrostatic deflector that can be manufactured easily and very accurately without using a member for positioning is provided. After multiple slitstohave been formed in the same direction as that of the bus bar of an approximately conical electrode materialwhose large-diameter section is formed with flange portionstofor installation on an insulator, each of the flange portions is coupled with the insulator, then the electrode materialis cut along extension lines of the slitsto, and thus, multiple electrode members electrically isolated from one another are formed.

Electrostatic deflector

The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscopeilluminates a specimenwith a charged particle beam via a charged particle optical system arranged in a column. According to the present invention, the scanning electron microscopehas a charge preventive memberdisposed between the objective lensand the specimen. The charge preventive memberhas an electrically conductive portion and an openingto transmit the charged particle beam. The charge preventive memberis formed so as to partly cover the charged particle optical system when viewed from the charged particle beam irradiation spot on the specimen. In addition, the charge preventive memberhas gas inflow pathsandformed therein. These gas inflow paths have gas injection outletsformed to inject gas toward the charged particle beam irradiation spot on the specimen.

Charged particle beam apparatus

Growing community of inventors

Tokyo, Japan

Masahiro Inoue