Nippon Sheet Glass Company, Limited

Other

Saint-gobain Recherche

Panasonic Corporation

Kaneka Corporation

Masahiro Hirata

Akira Fujisawa

Tsuyoshi Otani

Yukio Sueyoshi

Toru Yamamoto

Hodaka Norimatsu

Hideo Kawahara

Koichiro Kiyohara

Akihiro Koyama

Yasuhiro Saito

Yukihito Nagashima

Akihiko Hattori

Yasunori Seto

Masatoshi Nara

Kiyotaka Ichiki

Yuko Tawada

Takahiro Asai

Koichiro Nakamura

Ryohei Tokunaga

Masato Hyodo

Takayuki Kawano

Isamu Kuroda

Hiroaki Tada

Yoshiaki Inoue

Toru Sawada

Masato Hyohdou

Hiroaki Ida

Hiroki Ando

Katsuaki Inoue

Kawaichi Katsumi

Hiroshi Iwabuchi

Kazumasa Nishio

Shizuo Mukae

Masao Misonou

The present invention provides a thin film-forming method by which, even when a thin film containing a crystalline metal oxide as the main component is formed over a wide area within a short time utilizing a thermal decomposition method, the thickness of the thin film becomes relatively uniform. A thin film-forming method of the present invention includes forming a thin film using a raw material containing a chloride of a metal, and prior to the forming of the thin film, 1) disposing metal-containing particles on the substrate, or 2) forming, at a film deposition rate slower than a film deposition rate for the thin film, a metal-containing thin film on the substrate, and wherein, in the case of the step 2), the thin film containing the metal oxide as the main component is directly formed on the metal-containing thin film.

Method for forming thin film, substrate having transparent electroconductive film and photoelectric conversion device using the substrate

A transparent conductive film wherein the height number distribution of projections present on the surface is expressed by a distribution function of &#x3c7;type having a degree of freedom of 3.5 to 15 when the unit of the horizontal axis is a nanometer, the height/width ratio number distribution is expressed by a distribution function of &#x3c7;type having a degree of freedom of 10-35&#x3c7;, the projections having a height of 50-350 nm account for 70% of more, and the projections having a height/width ratio of 0.25-1.02 account for 90% or more.

Transparent conductive film and its manufacturing method, and photoelectric conversion device comprising it

The present invention provides a method for forming a transparent thin film by a chemical vapor deposition method using a gaseous raw material. In the method, a film growth rate is at least 8 nm/s, and the transparent thin film contains at least one selected from carbon (C) and oxygen (O), nitrogen (N), hydrogen (H), and silicon (Si). According to this method, a transparent thin film that does not peel off a substrate easily due to the eased tension in the thin film and has high transmittance in the visible light region can be deposited on a glass ribbon in a float bath.

Method for forming transparent thin film, transparent thin film formed by the method, and transparent substrate with transparent thin film

The present invention provides a glass sheet formed on molten tin, that exhibits a high transmittance that is originally inherent to its composition. In this glass sheet, the difference between a visible light reflectance of a surface formed in contact with the molten tin and a visible light reflectance of a surface on the opposite side thereof is not greater than 0.25%. And when the glass sheet's thickness is 4 mm, a light transmittance at 540 nm wavelength is at least 91.5%, and a light transmittance at 450 nm wavelength is at least 91.0%, and after irradiating UV light for 6 hours as specified in the radiation-proofing test according to JIS R3212, a light transmittance at 540 nm wavelength is at least 91.0% and a light transmittance at 450 nm wavelength is at least 90.5%.

Glass sheet and glass sheet photoelectric converter device

The present invention provides a photoelectric conversion device that improves photoelectric conversion efficiency with the interaction between a transparent substrate with a transparent conductive film, an antireflection film, and a photoelectric conversion unit. The antireflection film contains fine particles having an average particle diameter of 0.01 to 1.0 &mgr;m and has an uneven surface derived from the fine particles. The glass sheet with a transparent conductive film has a light transmittance of 75% or more in the wavelength region of 800 nm to 900 nm. The photoelectric conversion unit includes at least a photoelectric conversion unit including a photoelectric conversion layer having a band gap of 1.85 eV or less.

Photoelectric conversion device

On a glass sheet, an undercoating layer and a conductive film containing tin oxide as a main component are formed suitably in this order. On the conductive film, a photoelectric conversion unit and a back electrode are formed, thus obtaining a thin film photoelectric conversion device. In the present invention, the absorption coefficient of this conductive film is decreased up to 1.2&times;10 cm or less. In another embodiment of the present invention, the chlorine concentration in a conductive film is set to be 0.11 wt. % or lower and the fluorine concentration in the conductive film is equal to or higher than the chlorine concentration. In still another embodiment, in a wavelength of 550 nm, a conductive film is formed so that a glass sheet with a conductive film has a transmittance of at least 79% and a haze ratio of at least 4%.

Glass sheet with conductive film, method of manufacturing the same, and photoelectric conversion device using the same

When a transparent conductive film formed on a glass sheet is heat-treated in the air, its conductivity decreases. Even if the conductivity is increased by a heat treatment in a nitrogen atmosphere or the like beforehand, it decreases considerably by heating in the air during a processing step to obtain a final product. The present invention provides a glass sheet with a transparent conductive film, in which the increasing rate of its sheet resistance is 15% or lower even after heating at 450&deg; C. in the air for three hours.

Glass sheet with conductive film and glass article using the same

An object of the present invention is to provide a cladding material, which has high joining strength and excellent productivity, and a manufacturing method therefor; in order to attain this object, the present invention provides a cladding material comprising: a first material to be joined which is made of aluminum or an aluminum alloy; a second material to be joined which is made of a single metal or an alloy and which is join the first material to be joined; and an intermediate layer which is provided between the first and second materials to be joined.

Cladding material and manufacturing method therefor

A hydrophilic mirror comprising a glass substrate having on the main surface side thereof a layer having a refractive index n at 550 nm, a layer having a refractive index n at 550 nm, a tin oxide layer having a refractive index n at 550 nm, and an overcoat in this order, the refractive indices n , n and n satisfying the relationship: n &gE;n >n , and having a visible light reflectance of 70% or more.

Hydrophilic mirror and method of producing the same

A substrate for a photoelectric conversion device that is effective in trapping light in a photovoltaic layer and can be manufactured by industrial mass-production, a method of manufacturing the same, and a photoelectric conversion device using the same. On a glass sheet containing an alkaline component, a first undercoating film containing tin oxide as a main component, a second undercoating film, and a conductive film containing tin oxide as a main component are formed in this order, thus obtaining a substrate. The first undercoating film is formed by a thermal decomposition oxidation reaction of coating-film forming materials containing chlorine on glass with a temperature of at least 600&deg; C. In the first undercoating film, holes are formed without an after-treatment. The surface of the conductive film above the holes has larger irregularities, thus scattering incident light on a photovoltaic unit. Further, on the photovoltaic unit, a back electrode is formed, thus obtaining a photoelectric conversion device.

Substrate for photoelectric conversion device, method of manufacturing the same, and photoelectric conversion device using the same

On a glass sheet, undercoating layers and a transparent conductive film containing tin oxide as the main component are formed in this order. The surface of the transparent conductive film is provided with roughness including convex portions and concave portions. The convex portions have a mean diameter in a range between 0.05 &mgr;m and 0.3 &mgr;m and include five convex portions or less with diameters of at least 0.5 &mgr;m per 100 &mgr;m of the surface. On the transparent conductive film, a photovoltaic unit and a back electrode are formed, thus obtaining a photoelectric conversion device.

Substrate for photoelectric conversion device, and photoelectric conversion device using the same

Light-colored high-transmittance glass is provided which is made of a composition containing, as coloring components, on a weight percent basis, 0.02 to 0.06% (excluding 0.06%) total iron oxide based on Fe O , less than 0.024% FeO, and 0 to 0.5% cerium oxide and having a ratio of FeO based on Fe O to the total iron oxide of less than 40%. The light-colored high-transmittance glass has a solar radiation transmittance of at least 87.5% and a visible light transmittance measured with the illuminant C of at least 90% when having a thickness of 3.2 mm. A glass sheet with a conductive film also is provided which includes a transparent conductive film formed on a surface of a glass sheet formed of the light-colored high-transmittance glass.

Light-colored glass of high transmittance and method for production thereof, glass plate with electrically conductive film and method for production thereof, and glass article

A low emissivity (low-E) glass and glass articles made of the low emissivity glass are provided, which permit controlling the solar heat shading property within a certain range without spoiling the transparency and heat insulating property thereof, to thereby realize a comfortable living condition in a wide region of the world or in a wide location of installment. A plurality of metallic oxide based films comprising metallic oxide are laminated on the surface of a glass substrate. The metallic oxide based films include a tin oxide based film containing antimony (SnSbOx film), and a tin oxide based film containing fluorine (SnO :F film), and further may include a tin oxide based film consisting essentially of tin oxide, and a silicon oxide based film. The SnSbOx film contains antimony in an amount of 0.01 to 0.2 in terms of mole ratio relative to an amount of tin (&equals;Sb mol/Sn mol), to avoid an excessive decrease in visible light transmittance.

Low emissivity glass and glass articles made of low emissivity glass

A transparent layered product in which the ratio of a refractive-index transition layer at the surface of a coating film is set to be a suitable ratio for increasing light transmittance is provided. In a coating film with a rough surface formed on a glass sheet, the thickness of a transition layer in which the refractive index varies continuously in its thickness direction is set to be in a range between 13% and 65% of the thickness of a layer having a substantially constant refractive index in the coating film.

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Osaka, Japan

Masahiro Hirata