Otsuka Pharmaceutical Company, Limited

Sumitomo Chemical Company, Limited

Sharp Kabushiki Kaisha Corporation

Masahiro Hasegawa

Kai Suzuki

Shailly Mehrotra

Susan Elizabeth Shoaf

Salin Gupta

Syed Asfar Mateen

Praveen Kumar Mididoddi

Akihiko Takahashi

Hitoshi Yasuda

Kiyoshi Minoura

Akira Sakai

Miho Yamada

Pharmaceutical formulation comprising centanafadine or a pharmaceutically acceptable salt thereof and an excipient, and related methods of manufacture and use, are disclosed.

Centanafadine pharmaceutical formulations, and methods of making and using same

An optical stack for a display device includes multiple layers that are incorporated into a display device that further includes a display panel. The optical stack includes a resin layer, an alignment film, an optical compensation layer, a polarizer, and a hard coat layer that are stacked in this order from a panel side. The optical stack is formed by preparing and coating a solution for each layer, and then curing and otherwise treating each layer as warranted for a particular layer, in turn to form the optical stack.

Display device having a multilayered optical stack in combination with a display panel and a touch panel

A sputtering target of a single crystal aluminum alloy which has a uniform concentration distribution of an added metal element and a controlled crystal orientation is prepared using a continuous casting apparatus equipped with a starting rod by solidifying a melt of aluminum having a purity of at least 99.9 wt. % which contains 0.1 to 3.0 wt. % of at least one metal element selected from the group consisting of elements having atomic numbers of 3 to 83, at a casting temperature of 670 to 850.degree. C. at a casting rate of 1 to 80 mm/min. in one direction with maintaining an angle between a center axis of a continuous casting mold and a direction of pulling a casting material at 2 degrees or less.

Sputtering target of single crystal aluminum alloy and method for

A sputtering target of a single crystal aluminum alloy which has a uniform concentration distribution of an added metal element and a controlled crystal orientation is prepared using a continuous casting apparatus equipped with a starting rod by solidifying a melt of aluminum having a purity of at least 99.9 wt. % which contains 0.1 to 3.0 wt. % of at least one metal element selected from the group consisting of elements having atomic numbers of 3 to 83, at a casting temperature of 670 to 850.degree. C. at a casting rate of 1 to 80 m/min. in one direction with maintaining an angle between a center axis of a continuous casting mold and a direction of pulling a casting material at 2 degrees or less.

Sputtering target of single crystal aluminum alloy

Disclosure is a method for producing a cryostatic stabilizer composed of high-purity aluminum which comprises extruding the high-purity aluminum at an extrusion temperature of 250.degree. to 500.degree. C., an extrusion speed of not more than 20 m/min and an extrusion ratio of 10 to 150 by using an extruding machine equipped with a cylindrical die having helical grooves or projections on the inner surface. The method is industrially advantageous.

Method for producing a cryostatic stabilizer

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Osaka, Japan

Masahiro Hasegawa