Canon Anelva Corporation

Masahiro Atsumi

Masaaki Ishida

Masahiro Shibamoto

Hiroshi Yakushiji

Hidekazu Nishimura

A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.

Deposition apparatus

A deposition apparatus includes a plasma generator for generating a plasma by arc discharge, and a deposition unit for forming a film on a member by the plasma generated by the plasma generator. The plasma generator includes a target holder for holding a target and applying a negative potential to the target, an anode to which a positive potential is applied, and a capture for capturing droplets from the target. The anode has an opening, and the capture is arranged in the opening.

This invention provides a deposition apparatus which forms a film on a substrate, comprising: a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.

A substrate support apparatus has a substrate holding portion to be inserted into a center hole formed in a substrate to support the substrate in a vertical orientation, and includes a first connecting plate connected to the substrate holding portion and a second connecting plate which faces the first connecting plate and is connectable to a transport robot that transports the substrate to a substrate holder. In addition, a shock absorbing member is arranged between the first connecting plate and the second connecting plate so as to allow a movement of the first connecting plate relative to the second connecting plate in horizontal and vertical directions. Support members are configured to connect the first connecting plate to the second connecting plate while allowing the movement of the first connecting plate relative to the second connecting plate.

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Fuchu, Japan

Masahiro Atsumi