Hitachi-High-Technologies Corporation

Hitachi, Ltd.

Masahiro Akatsu

Mitsugu Sato

Chisato Kamiya

Masanori Watanabe

Shuichi Nakagawa

Masaru Matsushima

Kazuhiro Koyama

Takeshi Ogashiwa

Daisuke Muto

Satoshi Okada

Mistuyoshi Kimura

Yusuke Tanba

A sample holder is provided allowing for favorable observation of a cross-sectional sample using a retarding method. The sample holder includes: a sample placement member on which a first fixing member, a cross-sectional sample as an observation sample, and a second fixing member are placed in contact with each other, and inserted inside the electronic optical lens barrel of an electron microscope; and a voltage introduction means for introducing a voltage to the sample placement member. The sample placement member has a positioning section for positioning the first fixing member, the cross-sectional sample, and the second fixing member onto a placement position. A positioning section positions the first planar surface of the first fixing member and the second planar surface of the second fixing member which are disposed respectively adjacent to the observation surface of the cross-sectional sample, parallel to the observation surface at locations equidistant from the observation surface.

Sample holder and method for fixing observation sample

Provided is an electron microscope on which a specimen holder to have high voltage applied is mountable. The specimen holder has safety (electric shock prevention) features, and attention is paid to the specimen holder in terms of operability. The microscope includes a specimen holder having a function of applying a voltage to a specimen mount disposed to load a specimen, a voltage source that supplies the voltage to be applied to the specimen mount, a voltage cable connected at one end thereof to the specimen holder, and a relay unit to which the other end of the voltage cable is connected, the relay unit being placed on a supporting base that supports a lens barrel of the electron microscope.

Electron microscope

Charged particle beam apparatus arrangements in which either a first noise absorber which provides noise absorbing performance specialized for a first frequency range including the natural frequency of the charged particle beam apparatus as reference, or a second noise absorber which provides noise absorbing performance specialized for a second frequency range including the frequency of acoustic standing waves generated within the cover as reference, or both of the first and second noise absorbers is/are disposed within a cover of the charged particle beam apparatus.

Charged particle beam apparatus having noise absorbing arrangements

Disclosed here is a high resolution scanning electron microscope having an in-lens type objective lens. The microscope is structured so as to detect transmission electrons scattering at wide angles to observe high contrast STEM images according to each sample and purpose. A dark-field detector is disposed closely to the objective lens magnetic pole. The microscope is provided with means for moving the dark-field detector along a light axis so as to control the scattering angle of each detected dark-field signal.

Electron beam device

A method and apparatus for generation of high frequency pulses and for excitation of nuclear magnetic resonance of a sample generates a plurality of modurated high frequency waves having different frequencies from each other, and combines the generated these high frequency waves so as to generate high frequency pulses which provide a frequency spectrum having a predetermined band, thereby a shortening of the high frequency pulse width as well as a narrowing of the frequency band is achieved.

Growing community of inventors

Hitachinaka, Japan

Masahiro Akatsu