Stanley Electric Co., Ltd

Ricoh Company, Ltd.

Masahiro Akamatsu

Yoshiaki Yasuda

Masanao Tani

Takanori Aimono

Eiji Mochizuki

Makoto Yoshida

Kenichi Kondo

Yukito Sato

Takahiro Saida

Tetsurou Saitoh

Satoshi Okada

An optical deflector includes a plurality of piezoelectric unimorph oscillating bodies (to) that cause a reflecting plate () to oscillate rotationally, centering upon a pair of flexible support units (and). The optical deflector forms a single structure of the oscillating plates (to), the reflecting plate (), the flexible support units (and), and a support body (), by connecting one set of the terminals of the oscillating plates (to) of the suite of piezoelectric unimorph oscillating bodies (to) to the flexible support units (and), and connecting the other set of terminals to the support body (). Furthermore, the plurality of piezoelectric unimorph oscillating bodies (to) each respectively comprise a plurality of parallel oscillating bodies (to--to--to-), and (-to-), and a suite of parallel actuators (-to--to-, and-to-).

Optical deflector and optical device

An optical deflector includes a mirror having a reflective plane; a torsion bar extending outwardly from a side of said mirror; a support surrounding said mirror; a piezoelectric cantilever including a supporting body and a piezoelectric body formed on the supporting body, one end of said piezoelectric cantilever being connected to said torsion bar, the other end of the piezoelectric cantilever being connected to said support, said piezoelectric cantilever, upon application of a driving voltage to the piezoelectric body, exhibiting a bending deformation due to piezoelectricity so as to rotate said torsion bar, thereby rotarily driving said mirror through said torsion bar; and an impact attenuator connected to said support, the impact attenuator being disposed in a gap between said mirror and said support.

Optical deflector

An optical deflector includes a mirror having a reflective plane; a torsion bar extending outwardly from an end of said mirror; a support surrounding said mirror; a first piezoelectric element, one end of said first piezoelectric element being connected to said torsion bar, the other end of the first piezoelectric element being connected to and supported by said support, said first piezoelectric element having at least one piezoelectric cantilever, the cantilever including a supporting body and a piezoelectric body formed on the supporting body to exhibit bending deformation due to piezoelectricity when a driving voltage is applied to the piezoelectric body, said piezoelectric element rotarily driving said mirror through said torsion bar when said driving voltage is applied; and a second piezoelectric element, one end of said second piezoelectric element being connected to said torsion bar, the other end of the second piezoelectric element being connected to and supported by said mirror.

The present invention is an apparatus and method for the fabrication of high quality silicon films by deposition of a silicon vapor onto a substrate. The silicon film fabrication apparatus includes a chamber, a crucible having an anode for melting a silicon metal, an anode for generating a DC arc discharge plasma, a substrate holder facing the crucible, and a heater for heating a substrate arranged in the substrate holder. The apparatus also includes a variable DC power supply, a cathode element including an electrode plate for generating the DC arc discharge plasma, a gas intake pipe penetrating through the electrode plate into the chamber, and an exhaust pipe having a valve facing the gas intake pipe. The silicon film is fabricated by disposing a substrate in a chamber, introducing hydrogen gas into the chamber, generating the DC arc discharge plasma, evaporating the silicon metal in the chamber, and depositing the silicon vapor on the substrate after the vapor passes through the DC arc discharge plasma.

Fabrication and method of producing silicon films

Growing community of inventors

Kanagawa, Japan

Masahiro Akamatsu