Fujitsu Corporation

Masahiko Susa

Akio Yamada

Koichi Yamashita

Naoki Nishio

Kenichi Kawakami

Kobayashi Katsuhiko

The present invention is a method of charged particle beam exposure wherein an area of an exposure pattern is exposed by irradiating a sample with a charged particle beam while moving said sample, comprising: a step of generating speed data including the speed distribution in a direction of movement of the sample in accordance with secondary data which is generated from a pattern data including at least data of the exposure pattern and data of an exposure position, and includes at least density information of the exposure pattern; and a step of irradiating the sample with the charged particle beam in accordance with the pattern data while being moved at variable speed in accordance with the speed data. According to the invention, the through-put is improved very much without any defect of the exposure.

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Tokyo, Japan

Masahiko Susa