Sumitomo Chemical Company, Limited

Masahiko Shimada

Koji Ichikawa

Takashi Nishimura

Yuki Suzuki

Mitsuyoshi Ochiai

Tatsuro Masuyama

Kazuhiko Hashimoto

Satoshi Yamamoto

Satoshi Yamaguchi

Takashi Hiraoka

Yuichi Mukai

Masako Sugihara

Akira Kamabuchi

Yoshiyuki Takata

Takayuki Miyagawa

Junji Shigematsu

Hyungjoo Kim

Soon Shin Kim

Disclosed are a salt represented by formula (I), an acid generator and a resist composition: wherein Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Rand Reach represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; Xand Xeach represent *—CO—O—, *—O—CO—, etc.; Lrepresents a single bond or a hydrocarbon group which may have a substituent; Arepresents a group having a lactone structure which may have a substituent; Land Leach represent a single bond or an alkanediyl group; Rrepresents an iodine atom or a haloalkyl group; Rrepresents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Zrepresents an organic cation.

Salt, acid generator, resist composition and method for producing resist pattern

Provided are a carboxylate capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. Disclosed are a carboxylate represented by formula (I) and a resist composition: wherein Ar represents an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent, Xrepresents an oxygen atom or a sulfur atom, Rrepresents a halogen atom or a haloalkyl group having 1 to 12 carbon atoms, Rrepresents a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH— included in the haloalkyl group and the alkyl group may be replaced by —O— or —CO—, m1 represents an integer of 1 to 6, m2 represents an integer of 0 to 4, and Zrepresents an organic cation.

Carboxylate, resist composition and method for producing resist pattern

Disclosed are a salt represented by formula (I), an acid generator and a resist composition: wherein Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Rand Reach represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; Xrepresents *—CO—O—, *—O—CO—, etc.; Lrepresents a single bond or a hydrocarbon group which may have a substituent; Ar represents an aromatic hydrocarbon group which may have a substituent; Xrepresents an oxygen atom or a sulfur atom; Rrepresents a halogen atom or a haloalkyl group; Rrepresents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m1 represents an integer of 1 to 6; m2 represents an integer of 0 to 4; and Zrepresents an organic cation.

A compound represented by the formula (I): 

Compound, resin, photoresist composition and process for producing photoresist pattern

Photoresist composition and process for producing photoresist pattern

A compound represented by the formula (I): wherein R, R, R, R, X, X, X, X, L, L, Land Lare defined in the specification.

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having an adamantane lactone group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. In the formula (a4), Rrepresents a hydrogen atom or a methyl group, and Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a methylene group of the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.

Resin, resist composition and method for producing resist pattern

A compound having a group represented by formula (Ia): wherein Rand Reach independently represent a Cto Cfluorinated alkyl group, ring W represents a Cto Calicyclic hydrocarbon group that may have a substituent, and * represents a binding site.

Compound, resin, resist composition and method for producing resist pattern

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein Rrepresents a hydrogen atom or a methyl group, and Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.

Resin, photoresist composition, and method for producing photoresist pattern

1. A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having a sulfonyl group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. wherein Rrepresents a hydrogen atom or a methyl group, and Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.

The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein Trepresents a C4-C34 sultone ring group optionally having one or more substituents, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, Rrepresents a hydrogen atom or a C1-C6 alkyl group, Zrepresents *-X&#x2014;, *-X&#x2014;X&#x2014;CO&#x2014;X&#x2014;, or *-X&#x2014;CO&#x2014;X&#x2014;X&#x2014;, Xand Xindependently each represent a C1-C6 alkanediyl group, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, * represents a binding position to X, and Rrepresents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

Resin and photoresist composition comprising the same

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit represented by formula (II), the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein Rrepresents a hydrogen atom or a methyl group, and Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom where a methylene group may be replaced by an oxygen atom or a carbonyl group; Rrepresents a hydrogen atom, a halogen atom or a Cto Calkyl group that may have a halogen atom; ring Xrepresents a Cto Cheterocyclic group containing a nitrogen atom and a carbonyl group, a hydrogen atom contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a Cto Chydrocarbon, a Cto Calkoxyl group, a Cto Cacyl group, or a Cto Cacyloxy group, and a methylene group contained in the heterocyclic group may be replaced by an oxygen atom or a carbonyl group.

The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein Trepresents a C4-C34 sultone ring group optionally having one or more substituents, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, Rrepresents a hydrogen atom or a C1-C6 alkyl group, when Xis &#x2014;O&#x2014;, Zrepresents *&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;O&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;N(R)&#x2014;X&#x2014;, *&#x2014;X&#x2014;O&#x2014;CO&#x2014;X&#x2014; or *&#x2014;X&#x2014;N(R)&#x2014;CO&#x2014;X&#x2014;, when Xis &#x2014;N(R)&#x2014;, Zrepresents *&#x2014;X&#x2014;, *&#x2014;X&#x2014;O&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;, *&#x2014;X&#x2014;X&#x2014;CO&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;X&#x2014;X&#x2014;, *&#x2014;X&#x2014;X&#x2014;CO&#x2014;X&#x2014;CO&#x2014; or *&#x2014;X&#x2014;CO&#x2014;X&#x2014;X&#x2014;CO&#x2014;, Xand Xindependently each represent a C1-C6 divalent aliphatic hydrocarbon group, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, * represents a binding position to X, and Rrepresents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

A salt having a group represented by the formula (I):-T&#x2003;&#x2003;(I)wherein T represents a C3-C36 alicyclic hydrocarbon group in which at least two methylene groups are replaced by &#x2014;O&#x2014; or &#x2014;S&#x2014; and which can have one or more substituents.

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Osaka, Japan

Masahiko Shimada