Mitsubishi Denki Kabushiki Kaisha

Masahiko Sakamoto

Koichi Sugimoto

Hajime Nakajima

Toru Oka

Osamu Murakami

Yoichi Ohmura

Masaru Imaizumi

Yasushi Kawashima

Masahiro Otani

Katsutoshi Kamakura

Isamu Higashioka

Shozui Takeno

Toshikazu Kitagaki

Susumu Hoshinouchi

Nobuyuki Zumoto

Takashi Okamuro

Hiroshi Sasai

Miki Kurosawa

Seigo Hiramoto

Hirokazu Sakuma

Koji Funaoka

Nobuyuki Kosaka

Toshiro Nakashima

Hiroshi Mitsuda

Hitoshi Tanaka

Yasuhiko Iwai

Yoshio Yamane

Toshiyuki Hokodate

Yoshinori Ito

A code disk for a high-resolution encoder that can detect an absolute position and a method for manufacturing a mold to produce the code disk are provided. The code disk is formed by using transparent substrate. The code disk includes a plurality of tracks provided on the transparent substrate and an area provided between the plurality of tracks. Each surface of the plurality of tracks has a different pattern. A level of the area is different from that of the each surface of the plurality of tracks. The method for manufacturing the mold includes steps of processing a plurality of tracks with a flat surface on material; processing an area with a level different from that of each surface, between the plurality of tracks; forming different patterns on the each surface; plating the first material; and peeling plating from the first material to obtain a mold.

Code disk with a plurality of tracks having different patterns

In an optical encoder comprising an optical scale in which a light transmission portion and a light non-transparent portion are arranged and an output pattern obtained by emitting an incident light functions as an optical code, a light source portion and a light detecting portion, the light non-transparent portion is constituted of at least one pair of inclined surfaces which are opposed in such a manner as to become farther away from each other towards the side where the incident light enters and set so that an incident angle of the optical axis of the incident light from the light source should not be smaller than a critical angle of incidence, and the light non-transparent portion is constructed so that the incident light which enters one inclined surface should be totally reflected thereon to enter the other inclined surface and then at least part of the incident light should be reflected on the other inclined surface, and a reflected light which is reflected on the other inclined surface should not enter a light emitting portion of the light source and a reflecting portion around the light emitting portion.

Optical encoder having a no track portion of an optical scale being placed at a position symmetrical to a light non-transparent portion within an irradiation region of incident light

Optical encoder with reduced reflected light error having a light non-transparent portion with inclined surfaces

A photoelectric rotary encoder includes a light source that emits a light beam, a returning section that returns the emitted light beam to a direction opposite to an emitting direction of the beam, and a photodetector that is disposed on a substrate on which the light source is disposed and that detects the returned light beam via a disk having a detection pattern section. The photoelectric rotary encoder detects rotational displacement of the disk based on the detected returned light beam. In this photoelectric rotary encoder, an optical element that lets a stray beam component of the light beam from the light source escape via a side surface of the optical element, is disposed in front of the substrate on which the light source and the photodetector are disposed. The optical element covers the substrate and integrates the optical element and the substrate.

Photoelectric rotary encoder

A laser machining device according to the invention is provided with a laser oscillator for generating a laser beam, a main deflecting galvannometer mirror, an F&#x3b8; lens, and a sub-deflecting means arranged in an optical path between the laser oscillator and the main deflecting galvanometer mirror. A means for splitting a laser beam is provided, and the sub-deflecting means is inserted into the optical path of one of the split laser beams. At the same time, both the split laser beams are incident from the same main deflecting galvannometer mirror to the F&#x3b8; lens, and a numerical aperture in the optical system constituted by the main deflecting galvannometer mirror, the F&#x3b8; lens, and an object is set to be not more than 0.08.

Laser machining device

A laser inspection apparatus has a light source for outputting laser beam, application means for irradiating the laser beam output from the light source to any desired position of a detected body , first detection means for detecting fluorescence generated from the detected body to which the laser beam is applied, and second detection means for detecting reflected light scattered on a surface of the detected body to which the laser beam is applied.

Laser inspection apparatus

A code reading pattern and an image pickup apparatus are provided for reading a symbol representing significant information, the symbol encoded by the pattern. The code reading pattern is formed by repeated markings of constant pitch on the surface of an object. The markings define area having at least one boundary, the at least one boundary defining an outline of the symbol. The apparatus includes a lighting system for illuminating the code reading pattern with parallel light, an imaging system for imaging light reflected from the pattern, a spatial frequency filtering system, located at the near back focal plane of the imaging system, for blocking regular reflected light and for transmiting diffracted light to project an image of the symbol, and a receiver for receiving the image.

Code reading pattern and an image pickup apparatus for reading the

An electron-beam exposure apparatus having a correction function for correcting deflection distortion. The correction function is carried out by the provision of a correcting device including an analog correction unit 35 and a digital correction unit having a memory unit 10 for storing correction data other than data that can be expressed by a cubic function. The capacity of such a memory unit can be made smaller than that of conventional apparatuses.

Electron-beam exposure apparatus

A method and apparatus for detecting and regulating a focused condition of an electron beam emitted from an electron gun of an electron beam welding apparatus. An electron beam of a low intensity is first directed onto the workpiece. The coil current of an electromagnetic condenser lens used to focus the electron beam is then varied linearly. The resulting electrons and other radiation produced from the workpiece as a result of this irradiation is then sensed and a signal corresponding to the intensity thereof is produced. The focus position of the electron beam is determined in accordance with variations in this signal.

Method and apparatus for detecting and regulating position of welding

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Tokyo, Japan

Masahiko Sakamoto