Tokyo Electron Limited

Masahiko Konno

Naoki Matsumoto

Hideo Kato

Michitaka Aita

Masayuki Shintaku

Taizo Okada

Naohiko Okunishi

A substrate processing apparatus configured to perform a preset processing on a substrate includes a pipe through which a liquid flows; a liquid leakage collector configured to receive the liquid leaking from the pipe; a first detector provided within the liquid leakage collector, and configured to detect the liquid; a second detector provided at a position higher than the first detector within the liquid leakage collector, and configured to detect the liquid; an indicator configured to notify liquid leakage information indicating a liquid leakage; a power supply configured to perform a power feed to the substrate processing apparatus; and a controller configured to control the indicator to notify the liquid leakage information based on a detection result of the first detector, and control the power supply to stop the power feed to the substrate processing apparatus based on a detection result of the second detector.

Substrate processing apparatus and control method therefor

A plasma processing apparatus for exciting a processing gas by a microwave, includes a focus ring extending in an annular shape, a first tubular member being wrapped around a central axis to extend along an outer periphery of the lower electrode below the focus ring, an annular member made of a dielectric material provided between the focus ring and the first tubular member a second tubular member extending along an outer periphery of the first tubular member and a choke portion suppressing a microwave propagating through the first tubular member via the focus ring and the annular member. And the choke portion protrudes outward in a diametrical direction of the first tubular from the outer periphery of the first tubular member and extends in an annular shape along the periphery of the first tubular member, the choke portion is covered by the second tubular member.

Plasma processing apparatus

A plasma processing apparatus includes a mounting table including a lower electrode and an electrostatic chuck, a high frequency power supply electrically connected to the lower electrode, a heater provided in the electrostatic chuck, a heater power supply for supplying a power to the heater, a filter unit including a filter connected to the heater power supply, a rod-shaped power feeder connecting the heater power supply and the heater via the filter, an insulating tubular portion having an inner hole through which the power feeder extends, and a conductive choke portion serving to suppress a microwave propagating through the tubular portion. The choke portion includes a first portion extending from the power feeder in a direction intersecting with a longitudinal direction of the power feeder and a cylindrical second portion extending, between the tubular portion and the power feeder, from a peripheral portion of the first portion.

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Miyagi, Japan

Masahiko Konno