Hitachi Chemical Company, Ltd.

Dai Nippon Toryo Co., Ltd.

Masahiko Hiro

Toshihiko Akahori

Shigeo Tachiki

Takuro Kato

Hajime Kakumaru

Yoshitaka Minami

Toshihiko Shiotani

Yoshihisa Nagashima

Toshiya Takahashi

Yuhji Yamazaki

Sigeo Tachiki

A negative type photosensitive electrodepositing resin composition comprising (a) a polymer obtained by neutralizing a copolymer of acrylic or methacrylic acid and having an acid number of 20 to 300 with a basic organic compound, (b) a non-water-soluble monomer having two or more photopolymerizable unsaturated bonds in the molecule, (c) a non-water-soluble photoinitiator, and (d) a benzotriazole derivative having one or more carboxyl groups, is effective for giving electrodeposited films with a low voltage or low electric current in a short time, and usable for forming resist patterns with high degree of resolution.

Negative type photosensitive electrodepositing resin composition

A photosensitive resin composition comprising (a) a compound having a group unstable to acids, (b) a compound generating an acid when exposed to actinic light, and (c) a benzotriazole derivative is suitable for forming a positive type photosensitive anionic electrodeposition coating material and is usable for producing printed circuit boards.

Positive type photosensitive anionic electrodeposition coating resin

A resin composition comprising (A) a copolymer obtained by copolymerizing (a) acrylic acid and/or methacrylic acid, (b) at least one compound having an unstable group against an acid such as t-amyl acrylate, t-amyl methacrylate, etc. and (c) a copolymerizable monomer such as n-butyl acrylate and (B) a photoacid generator is effective for providing an electro-deposition bath good in water dispersion stability and an electrodeposited film having high sensitivity and high resolution.

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Hitachi, Japan

Masahiko Hiro