Matsushita Electric Industrial Co., Ltd.

Panasonic Corporation

Masahide Yokoyama

Hiroshi Hayata

Toshiyuki Suemitsu

Eiji Ohno

Takahiro Kurokawa

Naotaka Hashimoto

Hiroto Sumida

Yuuji Omata

Kazunori Ishikawa

Takahiro Kitai

Noboru Yamada

Nobuo Akahira

Kenichi Nagata

Yoshitaka Sakaue

Youichi Ohnishi

Masahiro Yamamoto

Kunio Tanaka

Hitoshi Yamanishi

Isamu Aokura

Munekazu Nishihara

Akira Okuda

Yoshiaki Tominaga

Mitsuhiro Takahashi

Mikio Takezawa

Hatsuhiko Shibasaki

Takahiro Takisawa

Nobuyuki Mori

Seiichiro Mori

A container having a plurality of orifices in an outer peripheral wall and having a space communicating with the orifices is rotated to extrude an electrically charged raw material liquid containing a polymer material from the space through the orifices by centrifugal force. This allows the electrically charged raw material liquid to form a fibrous material. At this time, the raw material liquid is supplied to the space in which the raw material liquid is filled by a raw material liquid pump so that the raw material liquid is extruded from the orifices at a predetermined pressure. That is, the raw material liquid in the space is pressurized. Also, the shape of the space in the container is set so that the centrifugal force exerted on the raw material liquid is constant.

Process of making nanofibers

Nanofibers are manufactured while preventing explosions from occurring due to solvent evaporation. An effusing unit () which effuses solution () into a space, a first charging unit () which electrically charges the solution () by applying an electric charge to the solution (), a guiding unit () which forms an air channel for guiding the manufactured nanofibers (), a gas flow generating unit () which generates, inside the guiding unit (), gas flow for transporting the nanofibers, a diffusing unit () which diffusing the nanofibers () guided by the guiding unit (), a collecting apparatus which electrically attracts and collects the nanofibers (), and a drawing unit () which draws the gas flow together with the evaporated component evaporated from the solution () are included.

Nanofiber manufacturing apparatus and nanofiber manufacturing method

A nanofiber production device produces nanofibers by stretching, in a space, a solution. The nanofiber production device includes: an effusing body which effuses the solution into the space by centrifugal force; a driving source which rotates the effusing body; a supplying electrode which is placed at a predetermined distance from the effusing body and supplies charge to the solution via the effusing body; a charging electrode to which a potential of reverse polarity to a polarity of the effusing body is applied, with the charging electrode being placed at a predetermined distance from the effusing body; and a charging power source which applies a predetermined voltage between the supplying electrode and the charging electrode.

Nanofiber production device and nanofiber production method

The present invention provides a method for forming thin films, wherein thin films with a uniform thickness can be formed on substrates as objects such as spheroids, even when the films are formed by conventional film-formation methods using an incident particle beam coming from a specific direction (e.g., evaporation and sputtering). In the method, thin films are formed on substrates such as spheroids with an incident particle beam coming from a particle source located in a specific direction by performing a spin motion together with a swing motion. The spin motion is a rotation of the substrate at a constant angular velocity about the spheroidal axis. The swing motion is a rotational oscillation of the same substrate for rotationally oscillating the axis at a constant cycle in one surface, where the center of the rotational oscillation is in the vicinity of the midpoint between two focal points on the axis of the spheroid. As a result, thin films with a uniform thickness in both the peripheral direction of the substrate and in the rotational axis direction of the spin motion can be formed even on substrates including spheroids.

Method for forming thin film, spheroid coated with thin film, light bulb using the spheroid and equipment for film formation

The plasma processing apparatus includes a substrate table,that extends from a wall of the vacuum chamber,toward the inside of the vacuum chamber,. A rotary holder,, to which the substrate,is mounted, is arranged in a concave portion,that is provided in the substrate table,. The rotary holder,is rotatably supported with its periphery being sealed with a sealing member,. Blades,are provided inside the rotary holder,. A supply port,and a drainage port,, for supplying and draining a fluid such that a rotation force is exerted on the blades,, are formed in the substrate table,. Supplying a fluid through the supply port,cools the substrate,while causing it to rotate.

Plasma processing apparatus

The present invention is to provide a method for manufacturing the PCE optical information recording disk under control of not only the crystallization velocity but also the complex index of refraction and thus the reflectance on the disk surface. The PCE optical information recording disk is suitable to be used under the constant angular velocity (the constant rotational numbers wherein the disk has a characteristic that the crystallization velocity is designed to become faster from inside area of the disk to outside area in the radical direction thereof under control of not only the crystallization velocity but also the complex index of refraction and thus the reflectance on the disk surface. In the case of mass production and high film formation to be required, the present invention provides an effective method for manufacturing the optical disk by means of sputtering from at least two targets at the same time in a manner that the crystallization velocity is increased in a radial direction from inside area to outside area in the disk.

Optical recording disk and method for manufacturing the same

A trigger gas feed system is normally kept opened before a discharge is started. The trigger gas feed system is shut instantaneously, for example, when the discharge is generated, thereby to set a vacuum chamber at a sputtering pressure. The trigger gas feed system is opened again after the discharge is finished. The opened state is continued until another discharge is started. Accordingly, the pressure in the vacuum chamber before the discharge is maintained always constant, and the vacuum chamber is returned to the sputtering pressure in a short time.

Sputtering method and apparatus using a trigger gas feed

Optical information recording disk and method for manufacturing the same

A magnetron sputtering apparatus has a plurality of ring-shaped flat targets with different diameters disposed about one center axis. The apparatus includes magnets having the same polarity as each other and placed on both front surface side and rear surface side of each of the targets along an inner circumferential edge thereof, and magnets having the same polarity as each other and placed on both front surface side and rear surface side of each of the targets along an outer circumferential edge thereof. The magnets placed along the inner and outer circumferential edges are placed in such a way that the magnets along the inner circumferential edge and the magnets along the outer circumferential edge become opposite in polarity to each other.

Magnetron sputtering apparatus and method

A sputtering apparatus uses a plurality of rectangular targets to form a thin film on a substrate, and includes a plurality of magnets disposed along both side edges of each target in such a manner that the polarities of adjacent magnets along the side edges of the targets are opposite, and polarities of the magnets confronting each other across the targets are opposite. The surfaces of at least two targets are inclined to a surface of the substrate at an angle not smaller than 30.degree. and not larger than 60.degree..

Sputtering apparatus and method

A magnetron sputtering apparatus has a ring-shaped flat target and includes magnets of the same polarity respectively arranged at a front side and a rear side of the target extending along an inner peripheral edge of the target, and magnets of the same polarity respectively arranged at the front side and the rear side of the target extending along an outer peripheral edge of the target. The magnets extending along the inner peripheral edge of the target are inverted in polarity relative to the other magnets extending along the outer peripheral edge of the target.

An ionization deposition apparatus includes an ion source which is located in a vacuum chamber and which is provided with gas introduction ports for supplying a gaseous film material into the vacuum chamber, a filament unit, which is separated into a plurality of independently controllable filaments, for generating thermoelectrons when the filaments are heated by filament currents, and an anode electrode for accelerating and colliding the thermoelectrons against molecules of the gaseous film material to thereby turn the molecules to plasma. A holder for holding a to-be-deposited object, the holder being placed confronting the anode electrode of the ion source in the vacuum chamber, and connected to a bias source to attract ions in the plasma to a surface of the holder.

Ionization deposition apparatus

A sputtering apparatus to be used in reactive sputtering which mixes a reactive gas into a discharge gas so as to form chemical compound thin membranes. A heating means is provided for heating the target. Light such as infrared rays or the like, and laser beams are ideal as the heating means. A thermometer for applying light is preferable to measure the temperature of at least one portion of the target for controlling the heating condition of the target. The composition of the thin membrane to be formed by the reactive sputtering can may be made constant.

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Osaka, Japan

Masahide Yokoyama