Toray Industries, Inc.

Masahide Senoo

Mitsuhito Suwa

Takenori Fujiwara

Hirokazu Iimori

Hiroyuki Niwa

Kazutaka Tamura

A positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant may be used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. The positive photosensitive siloxane composition includes a siloxane polymer, quinonediazide compound and solvent, and a cured film formed of the composition has a light transmittance per 3 &#x3bc;m of film thickness at a wavelength of 400 nm of 95% or more.

Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film

The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1)(Rand Rare aromatic rings, and Rrepresents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. Rto Rmay be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2)(Rto Rare each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of Rto Ris an aromatic ring with an electron-donating group. Rto Rmay be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.

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Shiga, Japan

Masahide Senoo