Nec Corporation

Organo Corporation

Masaharu Nakamori

Hidemitsu Aoki

Yoshimi Shiramizu

Hirofumi Seo

Haruto Hamano

Koji Yamanaka

Yasushi Sasaki

Yuji Shimizu

Hiroshi Kitajima

Makoto Morita

Kaori Watanabe

Yukinari Yamashita

Takashi Imaoka

Takashi Futatsuki

Ichiro Honma

Nahomi Ohta

Makoto Iuchi

In a method of manufacturing a semiconductor device that has an amorphous-silicon film onto which hemispherical grains are grown, a silicon wafer is cleaned at an elevated temperature using amnmonia hydrogen peroxide water solution, cleaned at an elevated temperature using chlorine hydrogen peroxide water solution, and then immersed in dilute hydrofluoric acid solution, after which it is rinsed with pure water, after which the amorphous-silicon film surface of the wafer is dried using isopropyl alcohol.

Semiconductor cleaning method

The method for producing electrolyzed water includes the step of applying a voltage to electrodes disposed in an electrolytic cell containing therein pure water including electrolyte therein. A strength of an electric field generated by applying a voltage to the electrodes is controlled to be variable by means of various techniques. The method makes it possible to produce electrolyzed water with a smaller amount of energy than prior methods.

Method for producing electrolyzed water

Electric parts including semiconductor substrates, glass substrates and the like are washed with various cleaning solutions. After the cleaning, said parts are cleaned with either anolyte or catholyte electrolytic ionized water (EIW) produced from deionized water.

Method and apparatus for cleaning electronic parts

In a wet processing apparatus, an electrolytic cell, a first storing cell for storing anode active water of the electrolytic cell, a first processing cell for processing a target with the anode active water of the first storing cell, a second storing cell for storing cathode active water of the electrolytic cell, and a second processing cell for processing a target with the cathode active water of the second storing cell are provided. Also, a first reactivating feedback path is provided between the first processing cell and an anode region of the electrolytic cell, and a second reactivating feedback path is provided between the second processing cell and a cathode region of the electrolytic cell.

Wet processing apparatus having individual reactivating feedback paths

Growing community of inventors

Tokyo, Japan

Masaharu Nakamori