Tohoku University

Fujikin Inc.

Other

Mitsubishi Chemical Corporation

Tokyo Electron Limited

Toshiba Mitsubishi-electric Industrial Systems Corporation

Nippon Light Metal Company, Ltd.

Nippon Valqua Industries, Ltd.

Nihon Ceratec Co., Ltd.

Masafumi Kitano

Tadahiro Ohmi

Nobukazu Ikeda

Yasuyuki Shirai

Akihiro Morimoto

Michio Yamaji

Yasuhiro Kawase

Hitoshi Morinaga

Fumikazu Mizutani

Makoto Ishikawa

Kouji Nishino

Masaaki Nagase

Kaoru Hirata

Atsushi Hidaka

Kazuyuki Morisaki

Masaki Hirayama

Yukio Minami

Takaaki Matsuoka

Tetsuya Goto

Tsutomu Yoshida

Koji Kawada

Yoshihito Yamada

Hisaaki Yamakage

Takatoshi Nakatani

Kazuteru Tanaka

Shigemi Murakawa

Keisuke Ideguchi

Kota Shirai

Hisakazu Ito

Minoru Tahara

Naoki Tanahashi

Kosuke Sugimoto

Kohei Watanuki

Van Tu Nguyen

Masayuki Saeki

Yukio Kishi

A controller capable of improving the disappearance resistance of a synthetic resin coating of a diaphragm, and a vaporization supply device comprising the controller. The controller includes a body having an inflow passage and an outflow passage, a valve seat provided between the inflow passage and the outflow passage, a diaphragm capable of being seated on or separated from the valve seat, and an actuator for causing the diaphragm to be seated on and separated from the valve seat. The material of the valve seat is nickel-based, and the diaphragm is provided with a synthetic resin coating on a surface of a side to be brought into contact with the valve seat.

Controller and vaporization supply device

A diaphragm valve includes a body () having a flow path (), a seat () formed in the flow path (), a metal diaphragm () for opening and closing the flow path (), a pair of clamping parts () and () for claiming peripheral edge portions of the metal diaphragm () to fix the metal diaphragm () to the body (), and an actuator () for abutting the metal diaphragm () to the seat () or separating the metal diaphragm from the seat (), wherein a fluorine resin coating is formed on a seat side surface () of the metal diaphragm () at least in a contact region (B-A) with the seat () in a region (C) surrounded by a clamping region (D-C) between the seat side surface () and one of the pair of clamping portions (), excluding the clamping region (D-C).

Diaphragm valve

A flow rate control system including a flow rate controller controlling a flow rate of a fluid supplied to a controlled object to keep a desired flow rate set value is provided, and includes a flow rate sensor, a pressure sensor measuring a pressure of a primary side of the flow rate controller, a PI calibration value determination unit determining a PI calibration value based on at least a physical property coefficient according to a physical property value of the fluid, a correction unit correcting an estimated flow rate, based on the PI calibration value and a measured value, and a drive control circuit adjusting an opening of a valve supplying the fluid to the controlled object based on the estimated value and controlling the flow rate of the fluid. A flow rate is accurately calculated regardless of types of a fluid in the pressure insensitive type flow rate controller.

Flow rate control system, control method of flowrate control system, and control program of flowrate control system

A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cmor less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.

Metal oxide film, laminate, metal member and process for producing the same

A heat equalizer includes a container structure having a heating block in which a working fluid is held for heating and vaporizing a material to be heated, a heater placed at the bottom of the container structure, and a material feed pipe allowing the outside and the inside of the container structure to communicate with each other. In the heating block, as a flow path in which the material to be heated flows, a main header pipe connected to the material feed pipe and extending in the horizontally, and a riser pipe branching from the main header pipe and extending vertically are formed. As a condensation path in which the working fluid is cooled and condensed, condensation holes formed respectively on the opposite sides of the riser pipe and extending horizontally, and a condensation pit formed under the riser pipe are formed. Between the condensation holes and the condensation pit, the main header pipe is placed.

Heat equalizer and organic film forming apparatus

Provided is an Al alloy member with an excellent mechanical strength that is sufficient for use in large-scale manufacturing apparatuses. The Al alloy member is characterized in that, in mass %, Mg concentration is 5.0% or less, Ce concentration is 15% or less, Zr concentration is 0.15% or less, the balance comprises Al and unavoidable impurities, the elements of the unavoidable impurities are respectively 0.01% or less, and the Vickers hardness of the Al alloy member is greater than 30.

Al alloy member, electronic device manufacturing apparatus, and method of manufacturing an anodic oxide film coated al alloy member

A conventional microwave plasma processing apparatus, even when krypton (Kr) is used as a plasma-generation gas, can only obtain an oxide film or a nitride film having the same level of characteristics as those obtained when a rare gas such as argon (Ar) is used as a plasma-generation gas. Accordingly, instead of forming a dielectric window of a microwave plasma processing apparatus with only a ceramic member, a planarization film capable of obtaining a stoichiometric SiOcomposition by thermal treatment is coated on one of a plurality of surfaces of the ceramic member, the surface facing a process space, and then thermally-treated, thereby forming a planarization insulation film having a very flat and dense surface. A corrosion-resistant film is formed on the planarization insulation film.

Microwave plasma processing apparatus, dielectric window for use in the microwave plasma processing apparatus, and method for manufacturing the dielectric window

Method for producing at low cost bellows which show high durability even when used in a quite reactive atmosphere. The method for manufacturing bellows includes the steps of: I: forming an untreated bellows from a flat base plate, the base plate including 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity (relative to 100 wt % of the base plate); and II: heating the untreated bellows at a temperature of 750 to 895&#xb0; C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H/HO) is in the range of 2&#xd7;10to 1&#xd7;10, thereby forming an AlOpassivation film on a surface of the untreated bellows.

Method of manufacturing bellows

A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second coating layer formed on the first coating layer and made of yttrium oxide by a plasma spraying method.

Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure

The invention provides a valve and a method of operating the valve that makes it possible to reduce the diameter of the vacuum exhaustion pipings to make the facility for the vacuum exhaustion system small, which results in lower costs and shortens vacuum exhaustion time, and also which can prevent corrosion, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of gas flowing through the pipings. In particular, in accordance with the present invention, an aluminum passivation is applied on the piping parts, i.e. the valve and others, that are used in the vacuum exhaustion system so as to inhibit gas decomposition caused by temperature rise at the time of baking so that components for reduction in the diameter size in the vacuum exhaustion system are provided. Thus, corrosion, cloggings and seat leakages caused by gas decomposition are prevented.

Valve for vacuum exhaustion system

A barrier film which has uniform thickness and excellent adhesiveness to the base material and superbly functions to protect a platinum film can be formed on the inner wall surface of a moisture-generating reactor at ease and at a low cost. The moisture-generating reactor in which hydrogen and oxygen are reacted to generate moisture without high temperature combustion is made of an alloy containing aluminum. A principally aluminum oxide (AlO)-composed barrier film is formed by applying an aluminum selective oxidation treatment on the inner wall surface of the moisture-generating reactor, and thereafter a platinum film is stacked on and stuck to the barrier film so that a platinum coating catalyst layer is formed.

Process of forming platinum coating catalyst layer in moisture-generating reactor

The present invention provides a valve which makes it possible to reduce the diameter of the vacuum exhaustion pipings for making the facility for the vacuum exhaustion system small, as a result lowering the costs, and making the vacuum exhaustion time short, and also which can prevent the corrosions, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of the gas. Specifically, the aluminum passivation is applied on the piping parts, i.e. the valve and others, used in the vacuum exhaustion system to inhibit the gas decomposition caused by the temperature rise at the time of the baking so that components for the reduction in the diameter size in the vacuum exhaustion system are provided. The corrosions, cloggings and seat leakages caused by the gas decomposition are prevented.

A diaphragm valveis provided with a bodyhaving a flow-in passagea flow-out passageand a valve seatformed between the passages; a diaphragminstalled in the bodyand permitted to rest on and move away from the valve seatand a driving meansinstalled on the bodyto allow the diaphragmto rest on and move away from the valve seatwherein synthetic resin filmsof predetermined thickness are coated on fluid-contacting partsof the afore-mentioned bodyand diaphragmA diaphragm valve in accordance with the present invention prevents corrosion of the valve members caused by accumulation and adherence of substances produced by thermal decomposition, and prevents clogging caused by substances produced, and prevents seat leakage when applied in the vacuum exhaust system of a semiconductor manufacturing facility.

Diaphragm valve for the vacuum exhaustion system

A member for a resin molding machine wherein it has a face contacting with a molten resin, and at least a part of the face is covered with a film of an oxide of a base material of the face or a component contained in the base material. The use of the member in the molding of a resin allows the prevention of the incorporation of a contaminant associated with the deterioration of a melt of the resin into a molded article from the resin.

Resin molding machine and member for resin molding machine having film in passive state

Growing community of inventors

Osaka, Japan

Masafumi Kitano