Nu Eco Engineering Co., Ltd.

Other

Brother Kogyo Kabushiki-Kaisha

Nagoya University

Meijo University

Tokyo Electron Limited

Katagiri Engineering Co., Ltd.

Nu System Corporation

Masafumi Ito

Masaru Hori

Hiroyuki Kano

Toshio Goto

Nobuo Ishii

Norihiko Nishizawa

Takayuki Ohta

Chishio Koshimizu

Satoru Kawakami

Koji Yamakawa

Tomohiro Suzuki

Yasuhiro Higashijima

Yasuyuki Okamura

Tatsuo Shiina

[Problem to be Solved] To improve the measurement accuracy of an interference measurement device which utilizes interference of light. [Means for Solution] An interference measurement device includes a light sourcefor emitting supercontinuum light (SC light), an optical fiber couplerfor splitting the SC light into measurement light and reference light, a dispersion compensation element, a drive unitfor moving the dispersion compensation element, and light-receiving meansfor measuring an interference waveform produced as a result of interference between the measurement light and the reference light. A measurement objectto be measured is an Si substrate having a thickness of 800 &#x3bc;m. The dispersion compensation elementis an Si substrate having a thickness of 780 &#x3bc;m. Namely, the dispersion compensation elementis formed of the same material as that of the measurement objectand is 20 &#x3bc;m thinner than the measurement object. The interference caused by reflection on the back surface of the measurement objectand reflection on the back surface of the dispersion compensation elementhas a narrow peak width because wavelength dispersion is cancelled almost completely. Thus, the accuracy in measuring the peak position improves. As a result, the accuracy in measuring temperature, etc., improves.

Interference measurement device and measurement method

The multi-micro hollow cathode light source has a cathode plate, an insulation plate, an anode plate, and metal pieces. The insulation plate is sandwiched by the cathode plate and the anode plate. The cathode plate is made of copper. The centers of the cathode plate, insulation plate, and anode plate, are provided with holes, respectively. The holes form a penetrating though-hole. Linear slots are disposed in the cathode plate continuously extending from the hole in a cross shape. Each slot penetrates the cathode plate. Four metal pieces made of materials different from one another are inserted and buried in the four slots.

Multi-micro hollow cathode light source and atomic absorption sepctrometer

A spectroscopy method, includes guiding pulse laser light to an optical fiber, which mutually reacts with a sample to be measured of a light absorptance characteristic, outputting ring down pulse light obtained through light absorption of the sample, measuring an absorptance characteristic of the sample based on an attenuation characteristic of the ring down pulse light, and setting the pulse laser light as wide-spectrum laser light, setting the optical fiber as a strong dispersive optical fiber, and increasing a pulse width of the ring down pulse light to measure a wavelength absorptance characteristic based on a ring down attenuation constant of a pulse train with respect to a time sequence corresponding to a wavelength.

Spectroscopy method and spectroscope

To achieve an apparatus capable of measuring a light absorption coefficient f a sample with high sensitivity. A ring down spectroscope uses a wavelength-variable femtosecond soliton pulse light source. Pulse light is input to a loop optical fiberthrough a first light waveguideand a wavelength selective switch. Ring down pulse light is input to a homodyne detector through the wavelength selective switch. On the other hand, pulse light propagating in the first light waveguideis split and input to light waveguides constituting a second light waveguidethrough an optical directional couplerand a first optical switching element. The pulse light propagating in the second light waveguideis input to the homodyne detector as reference light and used for synchronous detection. The plural light waveguides constituting the second light waveguidediffer in optical length in accordance with the length of the optical fiber, and can slightly change the optical length.

An atomic analyzer includes a plasma generator, in which a discharge gas is fed in a micro gap between a pair of electrodes to generate nonequilibrium atmospheric pressure plasma, a bias voltage controller that includes a plasma-leading electrode for leading the nonequilibrium atmospheric pressure plasma generated by the plasma generator to an object to be irradiated, the object to be irradiated with the nonequilibrium atmospheric pressure plasma is placed on the plasma-leading electrode, a bias voltage is applied between the plasma-leading electrode and the electrodes of the plasma generator to irradiate the object with the nonequilibrium atmospheric pressure plasma, and a spectrometer that analyzes atoms spectroscopically from light emitted from atomized generated by atomizing a substance composing the object to be irradiated by the nonequilibrium atmospheric pressure plasma irradiation or from light absorbed by the atomized atoms.

Atomic analyzer

The temperature of the surface and/or inside of a substrate is measured by irradiating the front surface or rear surface of the substrate, whose temperature is to be measured, with light and measuring the interference of a reflected light from the substrate and a reference light. A method and apparatus for measuring temperature or thickness which is suitable for directly measuring the temperature of the outermost surface layer of a substrate, and an apparatus for treating a substrate for an electronic device, which uses such method, are provided.

Method and apparatus for measuring temperature of substrate

A controlled plasma deposition system and method are provided including a vacuum vessel. An electron adding mass spectrometer is connected to a vacuum vessel for carrying out a gas treatment for a semi-conductor wafer. In the mass spectrometer, a gas in the vacuum vessel is incorporated, and electrons are added to the particles in the gas. Then the value of negative ions obtained by ionizing the particles, for example specific radicals, is measured. Once measured, the information is forwarded to a controller that may optimize the plasma deposition method.

Plasma deposition apparatus and method with controller

Sewing machine

Tape cartridge for tape printer

Growing community of inventors

Nagoya, Japan

Masafumi Ito