Tdk Corporation

Masachika Hashino

Hiromichi Umehara

Kenzo Makino

Hisayoshi Watanabe

Keita Kawamori

Koichi Otani

Tatsuhiro Nojima

Masahiro Saito

Norikazu Ota

Satoshi Miura

Hitoshi Hatate

Naomichi Degawa

Tetsuya Hiraki

Hideyuki Yatsu

Hideyuki Ukita

Hidekazu Kojima

Michitoshi Tsuchiya

Takayuki Nishizawa

Ken Fujii

Tsutomu Nishinaga

A magnetic sensor includes an insulating layer including a protruding surface, a first MR element, and a second MR element. The protruding surface includes a first curved surface portion. The first curved surface portion includes a first portion including an upper end portion of the protruding surface, and a second portion continuous with the first portion at a position away from the upper end portion of the protruding surface. When the shape of the protruding surface is regarded as a function Z, the mean value of the absolute value of a second derivative Z″ of the function Z corresponding to the first portion is smaller than the mean value of the absolute value of the second derivative Z″ of the function Z corresponding to the second portion.

Sensor having protruding surface

A magnetic sensor includes an insulating layer, a first MR element, and a second MR element. The insulating layer includes a protruding surface including first and second inclined surfaces. Each of the first and second MR elements includes a magnetization pinned layer and a free layer. The magnetization pinned layer and the free layer of the first MR element are disposed on the first inclined surface. The magnetization pinned layer and the free layer of the second MR element are disposed on the second inclined surface. The dimension of the protruding surface in a direction parallel to the Z direction is in the range of 1.4 μm to 3.0 μm.

Sensor

A magnetic sensor includes an insulating layer, a first MR element, and a second MR element. The insulating layer includes a first layer and a second layer, and also includes first and second inclined surfaces formed across the first layer and the second layer. Each of the first and second MR elements includes a magnetization pinned layer and a free layer. The magnetization pinned layer and the free layer of the first MR element are disposed on the first inclined surface. The magnetization pinned layer and the free layer of the second MR element are disposed on the second inclined surface.

Sensor including at least one inclined surface

Sensor including protruding surface

A magneto-resistive effect element (MR element) has an upper shield that is magnetized in a cross track direction, a lower shield that is positioned at an interval relative to the upper shield in a down track direction, and a multilayer film that is positioned between the upper shield and the lower shield and that faces an air bearing surface (ABS). The multilayer film has a free layer where its magnetization direction fluctuates relative to an external magnetic field, a pinned layer where its magnetization direction is pinned against the external magnetic field, a nonmagnetic spacer layer that is positioned between the free layer and the pinned layer, and an insulating layer that is positioned at a back side of the free layer viewed from the ABS. The MR element further has a pair of side shields that are positioned at both sides of the free layer and the insulating layer in a cross track direction. The side shields contact the upper shield on the sides of the free layer and the insulating layer in the cross track direction.

Magneto-resistive effect element having side shield integrated with upper shield

A method for manufacturing a pattern multilayer body that has a plurality of pattern layers, and where a pattern is formed in each pattern layer, includes a step of forming an overlay pattern within an overlay pattern formation region, and in the step of forming the overlay pattern, a photoresist film is formed, and after a photoresist film is exposed via a main mask, a resist pattern is formed by exposing a sub mask(s). The main mask has a pattern light-shielding part that is commonly used for forming a pattern in each pattern layer, and each main light-shielding part for forming each overlay pattern; and a sub mask has an opening part that is exposable to an unexposed region(s) within an overlay pattern formation region other than an unexposed region(s) on the photoresist film, which has been light-shielded by the main light-shielding part for forming a corresponding overlay pattern.

Manufacturing method for pattern multilayer body and mask set

A perpendicular magnetic write head includes: a magnetic pole having an end surface exposed on an air bearing surface, and extending in a height direction perpendicular to the air bearing surface; a first yoke having an end surface exposed on the air bearing surface, and facing a forward section of the magnetic pole with a gap layer in between; a second yoke located behind the first yoke with an insulating layer in between in the height direction, and connected to a backward section of the magnetic pole; a shield connecting the first yoke to the second yoke; and an additional magnetic layer located behind a boundary between the first yoke and the insulating layer, and in contact with the first yoke.

Perpendicular magnetic write head and magnetic recording device having additional magnetic layer contacting front yoke and shield

A method for manufacturing a thin-film magnetic head includes processes of forming a polishing position sensor and a recording head portion alongside on one side of a wafer. The process of forming the recording head portion has a step of performing a photolithography process after applying an alkali soluble resin film and a photoresist film in the named order. The process of forming the polishing position sensor has a step of performing a photolithography process on the photoresist film while having only the photoresist film out of the alkali soluble resin film and the photoresist film.

Method for manufacturing thin-film magnetic head

A method of forming a magnetic pole section of a perpendicular magnetic recording type thin-film magnetic head and a method of manufacturing a perpendicular magnetic recording type thin-film magnetic head that include forming on an under layer a resist pattern having an opening, forming a first nonmagnetic layer, forming a first magnetic layer forming a magnetic layer pattern, removing the resist pattern and then applying a resist layer onto a first nonmagnetic layer and a magnetic layer pattern, developing or ashing partway the applied resist layer and baking the remaining resist layer, removing the first nonmagnetic layer from at least a side surface of the magnetic layer pattern by etching with the baked resist layer being left, removing all of the resist layer and then forming a second nonmagnetic layer on at least the magnetic layer pattern, and forming a second magnetic layer on the formed second nonmagnetic layer.

Method of forming magnetic pole section of perpendicular magnetic recording type thin-film magnetic head and manufacturing method of perpendicular magnetic recording type thin-film magnetic head

A method of manufacturing a perpendicular magnetic head having a writing element that writes magnetic information to a recording medium includes forming a main magnetic pole part generating a magnetic field on a substrate; removing at least a part of the substrate and a material existing at a circumference of the main magnetic pole part to expose an entire circumference of the main magnetic pole part at a surface that becomes an opposing medium surface (ABS) opposite to the recording medium; forming a shield gap film that is made of a nonmagnetic material so as to cover the entire circumference of the main magnetic pole part at least at the surface that becomes the ABS; and forming a shield layer so as to cover an entire circumference of the shield gap film at least at the surface that becomes the ABS.

Method for manufacturing perpendicular magnetic head including a main pole surrounded by shield layers

A manufacturing method for a magnetic head includes the steps of: forming a structure on a lower shield, the structure including a lower gap, a main magnetic pole and first and second side gaps; forming first and second side shields; forming an upper gap; and forming an upper shield. In the step of forming the structure, an initial lower gap layer is formed on the lower shield, the initial lower gap layer including a pre-lower-gap portion, and two to-be-removed portions that are located on opposite sides of the pre-lower-gap portion. Then, a protrusion including the main magnetic pole and the first and second side gaps is formed on the pre-lower-gap portion. With the top surface of the protrusion covered with a mask, the initial lower gap layer is etched in part to thereby form the lower gap.

Growing community of inventors

Tokyo, Japan

Masachika Hashino