Hoya Corporation

Masaaki Yoshihara

Hitoshi Kamura

Hajime Kamiya

A substrate holder (,) on which a plurality of optical lens base materials (,) are arranged is installed to be rotatable in a vacuum atmosphere and a vacuum processing chamber (,) for forming water repellent films on the surfaces of the optical lens base materials, and further a both sides simultaneous water repellency processing mechanism is installed in this vacuum processing chamber. In regard to the substrate holder (,), an upper side water repellency processing unit (,) and a lower side water repellency processing unit (,) are provided, and the upper side water repellency processing unit forms the water repellent film on the upper side of the optical lens base material, while the lower side water repellency processing unit forms the water repellent film on the lower side of the optical lens base material. This configuration forms the water repellent films simultaneously onto the both sides of the optical lens base material. A film thickness correcting mechanism for the water repellency processing is composed of a film thickness correcting plate (,) for correcting a film thickness difference, which is arranged between the water repellency processing unit and the optical lens base material.

Mechanism for performing water repellency processing on both sides simultaneously

Plastic optical devices in which an antireflection film (,) is coated on the surface of a plastic base material (,). The antireflection film (,) is a multi-layered film which is formed by depositing a first layer (,) on the side of the plastic base material substantially by a high-refractive material and the next layer (,) by a low-refractive material, and by alternately laminating those high-refractive materials and low-refractive materials. The surface of the optical lens base material (,) has curvature and a plurality of the optical lens base materials (,) are disposed horizontally at the positions of concentric circles in a circular plate holder (,) which is placed horizontally and is rotatable. A sputtering film deposition system comprises targets (,) facing to the surfaces of the optical lens base materials (,). Thickness correcting plates function as mask members (,) for regulating the difference of film thickness disposed in the direction connecting the peripheral part and the center part in the holder and between the targets (,) and the holder (,).

Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film

Antireflection films are coated on the both sides of an optical lens by sputtering in a sputtering system. In a vacuum processing chamber (,) for performing the sputtering, a plurality of optical lens base materials are placed transversely on a substrate holder (,). The holder (,) is set rotatably in a vacuum atmosphere. The optical lens base materials are embedded to holes (,) formed in the holder (,), facing their concave surface up, by using ring-shaped holding tools (,). The height of the ring-shaped holding tool (,) is larger than the height of the edge of the optical lens base material (,) within the limits of 2 mm when the thickness of the lens edge of the optical lens base material is large. Part of the ring-shaped holding tool (,) which is put together with the upper surface of the optical lens base material (,) is tapered when the thickness of the lens edge of the optical lens base material is small.

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Tokyo, Japan

Masaaki Yoshihara