Canon Kabushiki Kaisha

Masaaki Yamamura

Kazuyoshi Akiyama

Ryuji Okamura

Koji Hitsuishi

Satoshi Kojima

Hitoshi Murayama

Hirokazu Ohtoshi

Shigeru Shirai

Minoru Kato

Teruo Misumi

Junichiro Hashizume

Toshiyasu Shirasuna

A process for producing a light-receiving member comprising a substrate and provided thereon a blocking layer and a photoconductive layer each comprised of a non-monocrystalline material is disclosed in which the blocking layer is comprised of a non-monocrystalline material comprising silicon atoms as matrix and at least one kind of atoms selected from the group consisting of carbon atoms, oxygen atoms and nitrogen atoms, the process comprising forming the blocking layer and the photoconductive layer by plasma CVD using glow discharge decomposition of a starting material gas caused by applying to the starting material gas an electromagnetic wave with a frequency of from 20 MHz to 450 MHz.

Process for forming deposited film for light-receiving member,

An electrophotographic light-receiving member comprises a conductive substrate and a light-receiving layer having a photoconductive layer and a surface layer which are successively layered on the conductive substrate, wherein;

Light receiving member

An electrophotographic light-receiving member comprising a conductive substrate 101 and laminated thereto a non-monocrystalline material photoconductive layer 102 and a surface layer 103. The photoconductive layer 102 is mainly composed of silicon atoms and contains at least carbon atoms and hydrogen atoms. The percentage of carbon atoms having a carbon-carbon bond in the photoconductive layer is controlled to be not more than 60% based on the whole carbon atoms contained therein, and, in an instance in which a blocking layer 104 is provided between the conductive substrate 101 and the photoconductive layer 102, the percentage of carbon atoms having a carbon-carbon bond in the blocking layer is also controlled. This makes it possible to prevent clusters of carbon atoms from being formed in the photoconductive layer or blocking layer. Making the carbon atoms have a uniform distribution in the silicon film enables improvement in electrophotographic performances such as charge performance, sensitivity, residual potential, ghost-free properties, etc.

Light-receiving member

In a microwave plasma chemical vapor deposition apparatus which comprises a substantially enclosed deposition chamber, a means for supporting a substrate on which a functional deposited film is to be formed, a means for supplying raw material gases, a means for evacuating the inside of said deposition chamber and a means for generating microwave discharge plasmas in said deposition chamber which includes a waveguide extending from a microwave power source and a microwave introducing window through which a microwave energy is to be introduced into said deposition chamber, the improvement characterized in that said apparatus is provided with a holding member capable of holding said microwave introducing window and said substrate and capable of sealing said deposition chamber in a air-tight state upon film-formation and said apparatus is provided with a means for transporting said holding member under vacuum condition.

Microwave plasma chemical vapor deposition apparatus for mass-producing

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Nagahama, Japan

Masaaki Yamamura