Hitachi, Ltd.

Masaaki Odakura

Shigenori Watari

Yoichiro Suzuki

In order to provide an automatic analyzer which ensures accurate absorbance measurement even when ultrasonic wave intensity for agitation of the sample and reagent or the like becomes excessive, multiple reaction vessels are placed as follows: As viewed from the top of the reaction disk , the reaction disk is divided into four parts, and the side wall of the reaction vessel does not intersect with two light beams which intersect with each other at right angles. Herein multiple reaction vessels are located at an inclined position approximately at an angle of about 45 deg. This layout allows the reaction vessel to have the surface exposed to ultrasonic wave intersecting to the applied ultrasonic wave appropriately at right angles, and absorbance measuring surface intersecting to the applied measurement wave appropriately at right angles. It is possible to configure that the surface exposed to ultrasonic wave and absorbance measuring surface are different surfaces to ensure that this absorbance measuring surface is not be exposed to ultrasonic wave.

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Naka-machi, Japan

Masaaki Odakura