Jsr Corporation

Jsr Life Sciences Corporation

Masaaki Miyaji

Tsutomu Shimokawa

Tomoki Nagai

Kouji Tamori

Yong Wang

Jun Numata

Hiroyuki Ishii

Yukio Nishimura

Masafumi Yamamoto

Yuji Yada

Toru Kajita

Takahiro Kawai

Tetsuo Fukuta

Takayoshi Abe

Masaki Momiyama

Eiichi Kobayashi

Daisuke Shimizu

Naoki Hayashi

Yusuke Okano

Tokio Sawai

Yingjia Xu

Shin-ya Omote

Fumihisa Miyajima

Yuusuke Okano

Hiroyuki Honma

Shin-Ya Omote

Provided are an additive and a surface treatment agent capable of suppressing agglutination of latex particles contained in a reagent for a latex agglutination reaction during storage of the reagent although a synthetic polymer is contained as an active component. An additive is to be added to latex particles used in a reagent for a latex agglutination reaction. The latex particles have not been subjected to blocking treatment. The additive includes a polymer containing more than 60% by mass and 99% by mass or less of hydrophilic repeating units (A) relative to all repeating units and 1% by mass or more and less than 40% by mass of hydrophobic repeating units (B) relative to all repeating units, and having a weight average molecular weight of 3,000 or more.

Additive, surface treatment agent, surface-modified latex particles, method for producing surface-modified latex particles, reagent for latex agglutination reaction, kit, and method for detecting target substance

Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier.R&#x2014;R&#x2003;&#x2003;(1) wherein R represents an amino acid sequence consisting of 4 to 300 amino acid residues containing a region consisting of 4 to 20 contiguous histidine residues; and Rrepresents an amino acid sequence capable of binding to immunoglobulin, the amino acid sequence consisting of 50 to 500 amino acid residues containing Z domain of Protein A or a fragment thereof, or a variant thereof, provided that the R binds to C-terminus or N-terminus of the R.

Filler for affinity chromatography and method for isolating immunoglobulin

An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles.

Packing material for affinity chromatography

A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein Ris a hydrogen or methyl, Ris a Ctertiary alkyl, Rand Rare a hydrogen, Calkyl, Caromatic, Calkoxyl, or Rand Rmay form, in combination and together with the nitrogen atom with which the Rand Rgroups bond, a Ccyclic structure, provided that Rand Rare not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

Radiation-sensitive resin composition

1. A copolymer having recurring units of the following formulas (1), (2), and (3), wherein R, R, R, and Rare a hydrogen atom or a methyl group, R, R, and Rrepresent a monovalent organic group, k is 1 or 2, 1 is 0&#x2013;4, n is 1&#x2013;3, m is 0&#x2013;3, Ris a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more Rgroups being the same or different, q is 1&#x2013;3, and p is 0&#x2013;3, the copolymer having a GPC average molecular weight of 3,000&#x2013;100,000. The composition is useful as a polymer component for a radiation-sensitive resin composition suitable as a chemically-amplified resist.

Copolymer, polymer mixture, and radiation-sensitive resin composition

A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1),wherein Ris a hydrogen or methyl, Ris a Ctertiary alkyl, Rand Rare a hydrogen, Calkyl, Caromatic, Calkoxyl, or Rand Rmay form, in combination and together with the nitrogen atom with which the Rand Rgroups bond, a Ccyclic structure, provided that Rand Rare not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same

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Minato-ku, Japan

Masaaki Miyaji