Dai Nippon Printing Co., Ltd.

The Furukawa Electric Co., Ltd.

Nippon Telegraph and Telephone Corporation

Furukawa Special Metal Co., Ltd.

Other

Kawasaki Steel Corporation

Asahi Kasei Emd Corporation

Dai Nippon Printing Co., Ltd. and Nippon Telegraph and Telephone Corporation

Masaaki Kurihara

Tetsuro Komukai

Akira Yoshida

Hironori Kobayashi

Makoto Abe

Makoto Nakamura

Toshikazu Segawa

Shigekazu Fujimoto

Masamichi Fujihira

Hiroshi Fujita

Hideshi Hattori

Hiroshi Nozue

Hideyuki Miyake

Tetsuro Inui

Masataka Nakazawa

Katsutoshi Suzuki

Toru Tanigawa

Uichi Akiba

Yasuji Fujii

Hiroki Okui

Shintaro Fujii

Kazuaki Baba

Toshiaki Inaba

Yuki Aritsuka

Koichi Hashiguchi

Ikuo Morita

Edson Gomes Camargo

Yukio Iimura

Motohiro Nabae

Kazuhiro Nagase

Yoshihiro Matsumoto

Morihisa Hoga

Yasuji Uesugi

Naoki Nishiyama

Rinsei Ikeda

Yuichi Kanayama

Hisatake Sano

Shigekaza Fujimoto

An object of the present invention is to provide a fabrication method for pattern-formed structure having a smooth three-dimensional structure through a fewer processes. To achieve the object, the present invention provides a fabrication method for pattern-formed structure comprising: a dot modulation pattern forming process of binarizing a shape of a targeted three-dimensional structure to form a dot modulation pattern, a writing process of using the dot modulation pattern to write directly by a writer on a photosensitive resin layer formed on a substrate, and a developing process of developing the photosensitive resin layer after the writing to form a resin layer with three-dimensional structure, wherein the writing process is performed by a writing energy supplying method in which writing energy is supplied to the photosensitive resin layer by an area larger than a minimum dot area in the dot modulation pattern.

Fabrication method for pattern-formed structure

A main object of the present invention is to provide a solid-state image sensor capable of efficiently collecting a light beam when the central position of the light receiving element and the central position of the micro lens do not coincide with each other in the plan view owing to a plural pixel sharing structure. To achieve the object, the present invention provides a solid-state image sensor comprising at least: a light receiving element for receiving a subject light to convert into a light signal; a micro lens for improving the light collecting rate to the light receiving element; and a signal readout circuit for reading a light signal generated from the light receiving element, such that the central position of the light receiving element and the central position of the micro lens do not coincide with each other in the plan view for having a plural pixel sharing structure with the single signal readout circuit shared by a plurality of the light receiving elements, wherein the micro lens having the maximum film thickness position different from the central position is provided such that the focus position of the micro lens with respect to a parallel ray is on the light receiving element.

Solid-state image sensor and method for producing the same

The present invention provides an optical device that is miniature, is highly sensitive and has a simplified package, and a manufacturing method thereof with high production efficiency and high reliability. The present invention is an optical device comprising: a photoelectric conversion element () having at least one photoelectric conversion portion () which is formed on a substrate (); a sealing material (); and a connection terminal (). The optical device comprises an optical window which is an interface between the photoelectric conversion element () and an outside of the optical device; and an aperture () formed in the sealing materialand whose bottom face is the optical window. An entire face of the optical window is exposed to the outside. An optical adjustment element () may be formed on the interface. In this case, the interface between the optical adjustment element () and the outside is the optical window.

Optical device and a method of manufacturing an optical device having a photoelectric conversion element and an optical adjustment element

It is an object of the present invention to effectively manufacture a charged-particle beam lithography mask, an X-ray lithography mask, or an extreme ultraviolet beam lithography mask by using, for example, an existing writer such as an electron beam writer for photomasks, while achieving improvement in processing accuracy of a mask pattern. A lithography mask () comprises a substrate () which has a lower surface provided substantially at the center thereof with an opening () and a self-supporting membrane (m) having a pattern region () substantially at the center of an upper surface of the substrate () corresponding to the opening (). The self-supporting membrane (m) is provided with through-holes (h) of a mask pattern in it or an absorber or scatterer of a mask pattern on it, and the pattern region () and a peripheral region around the pattern region () are in one plane.

Transfer mask blank, transfer mask, and transfer method using the transfer mask

A main object of the present invention is to provide a method for manufacturing a microlens that can easily form a microlens having a smooth shape, in which a maximum thickness position is different from a gravity center position. To attain the object, the present invention provides a method for manufacturing a microlens comprising processes of: a basic shape forming-exposure process for performing exposure by using a microlens basic shape-forming mask to a photosensitive resin layer formed on a substrate; and a deforming-exposure process for performing exposure, with a unit cell-exposure profile different from that of the exposure performed in the basic shape forming-exposure process, to the photosensitive resin layer by using a microlens-shape-adjusting mask, wherein a microlens, having a maximum thickness position different from a gravity center position is formed.

Method for manufacturing microlens

The invention relates to a process for the fabrication of an optical fiber-processing phase mask that is reduced in terms of pitch variations on the mask and stitching errors, and provides a process for the fabrication of a chirped type optical fiber-processing phase mask wherein a grating form of grooves provided in one surface of a quartz substrate is configured as an optical fiber-processing grating pattern. At an exposure step, writing data obtained by arranging and compiling a plurality of data for a repetitive groove-and-strip pattern while the pitch of repetition is modulated are used and an electron beam resist is provided on a phase mask blank, so that writing is carried out all over the writing area on said phase mask blank continuously in a vertical direction to said grating form of grooves.

Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a Bragg grating, and dispersion compensating device using the optical fiber

The present invention provides a substrate-engraving-type chromeless phase-shift mask enabling to adopt a manufacturing method which poses no problem in quality, gives a high operating efficiency, and permits arrangement of characters and symbols, and a manufacturing method thereof. The substrate of the invention has a character/symbol section, on a surface of a transparent substrate, comprising characters and/or symbols engraved in the form of a slit-shaped or lattice-shaped pattern comprising concave grooves only in a prescribed portion corresponding to the characters and/or symbols.

Substrate having character/symbol section and processing method of character/symbol section

The present invention relates to a precision phase mask for forming diffraction grating in optical fiber and optical waveguide, to provide them with nonlinear chirped grating for dispersion compensation use and having low fluctuation or crosstalk in the group delay characteristics. The diffraction grating is formed by means of interference fringe between diffracted lights of different orders, in which the cycle of the diffraction gratingincreases nonlinearly, wherein plurality of diffraction gratings G, G, G. . . having different cycles are assembled on a plane in increasing order of the cycle with the directions of the diffraction gratings directed to the same direction, and assembled in such a manner that, where the cycle of grating changes nonlinearly and discontinuously, the regions having larger rate of change of the cycle contain proportionally more discontinuous phases per unit length.

Phase mask for forming diffraction grating, and optical fiber and optical waveguide having diffraction grating duplicated using the phase mask

A patterning method for micro-contact printing involves the steps of: applying a resin on a master having projected patterns, hardening the resin and thereafter removing the hardened resin from the master to make a stamp of the resin; applying a molecular ink including hydrophobic molecules dispersed in a solvent on the stamp; forming micro-contact printed patterns of the hydrophobic molecular layer on a substrate by means of the stamp on which the molecular ink is applied; dipping the substrate with micro-contact printed patterns in a hydrophilic molecule solution dispersed in a solvent to give chemical modification to the areas of the surface of the substrate around the micro-contact printed patterns, the solution including hydrophilic molecules having a chain length shorter than the chain length of hydrophobic molecules included in the molecular ink is used as the hydrophilic molecule solution. According to the method, printed products having micro-contact printed patterns of a molecular level are obtained with a contrast between the micro-contact printed patterns and the area of the surface of the substrate around the micro-contact printed patterns.

Patterning method with micro-contact printing and its printed product

The present invention relates to a method of producing an optical fiber-processing phase mask having minimized connection errors that may degrade the spectral line shape and group delay characteristics of an optical fiber diffraction grating fabricated by using the phase mask. The present invention provides a method of producing an optical fiber-processing phase mask having a repeating pattern of grating-shaped grooves and strips provided on one surface of a transparent substrate, so that diffracted light produced by the repeating pattern is applied to an optical fiber to fabricate a diffraction grating in the optical fiber by interference fringes of diffracted light of different orders. In making a mask having a plurality of juxtaposed patterns (P to P ) having a linearly or nonlinearly increasing or decreasing pitch and a uniform groove-strip width ratio, multiple exposure is carried out to minimize difference between the pitch at the joint between patterns having different pitch data and the pitch in each individual pattern.

Method of making phase mask for machining optical fiber and optical fiber having bragg diffraction grating produced using the phase mask for machining optical fiber

The invention relates to a method of fabricating an optical fiber-processing phase mask in which a stitching error ascribable to a deterioration in the wavelength selectivity of the optical fiber diffraction grating to be fabricated is reduced. At an exposure step, a writing stage with a phase mask blank placed thereon is continuously fed in one direction while portions of the phase mask blank corresponding to grooves or strips in a direction perpendicular to the direction of feeding are sequentially scanned with writing beams , whereby the entire area of the phase mask blank to be written is continuously written.

Method of producing phase mask for fabricating optical fiber and optical fiber with bragg's diffraction grating produced by using the phase mask

The invention relates to an optical fiber-processing phase mask which enables a phase mask with a groove pitch varying in a position-dependent manner to be easily obtained by electron beam writing, and its fabrication method. In the optical fiber-processing phase mask comprising on one surface of a transparent substrate a repetitive pattern of grooves (,) and strips (,) located in a grating form, so that an optical fiber is irradiated with diffracted light according to the repetitive pattern to make a diffraction grating in said optical fiber by an interference fringe of diffracted light of different orders, a plurality of patterns (A,to A,) having a linearly or nonlinearly increasing or decreasing pitch are juxtaposed, with a constant width ratio between the grooves (,) and the strips (,). The phase mask is fabricated by carrying out writing while the groove-and-strip patterns with a different pitch are juxtaposed.

Phase mask for processing optical fibers and method of manufacturing the same

The invention relates to a diffraction grating-forming phase mask which can make the diffraction grating to be formed substantially free of any defect, even when foreign matters or resins, etc. sublimed from an optical fiber are deposited on the surface of the phase mask. The phase mask,comprises a substrate and a grating form of repetitive groove (,)-and-strip (,) pattern for forming a diffraction grating by interference fringes of diffracted light through the repetitive pattern. An optically transparent protective layer,is applied over the surface of the substrate with the repetitive groove (,)-and-strip (,) pattern formed thereon.

Phase mask for manufacturing diffraction grating, and method of manufacture

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Tokyo, Japan

Masaaki Kurihara