Ebara Corporation

Nec Corporation

Kabushiki Kaisha Square Enix

Masaaki Kimura

Mitsutoshi Yahagi

Jumpei Fujikata

Fumio Kuriyama

Yuji Araki

Toshikazu Yajima

Nobutoshi Saito

Takashi Takemura

Rei Kiumi

Takahiro Matsui

Shoichiro Ogata

Mizuki Nagai

Hiroyuki Kanda

Yasuhiko Endo

Yoshio Minami

Yugang Guo

Yusuke Tamari

Sachiko Takeda

Junichiro Tsujino

Hironari Ikeda

Provided are an anode holder capable of reducing consumption of an additive in a plating apparatus, and a plating apparatus. An anode holder for holding an anode for use in a plating apparatus is provided, and the anode holder includes an inner space formed in the anode holder, to house the anode, a mask including a plurality of holes, and configured to cover a front surface of the inner space, and a diaphragm, at least part of the diaphragm being fixed to the mask in a region of the mask that covers the front surface of the inner space.

Anode holder, and plating apparatus

An information processing device system according to an aspect of the present disclosure includes: at least one memory configured to store instructions; and at least one processor configured to execute the instructions to: acquire a customer identifier (ID) that identifies a customer at a store; generate action information that represents an action of the customer in the store; and assign points in association with the customer ID based on the action information.

Information processing device, processing method, and recording medium

An article recommendation device includes: a memory; and at least one processor coupled to the memory. The processor performs operations. The operations include: acquiring a first article based on information related to a predetermined evaluation in a networking service; acquiring at least one of a category that includes the acquired first article and a feature of the first article; acquiring a second article related to at least one of the acquired category and the feature; and displaying the acquired second article as a recommended article.

Article recommendation device, article recommendation method, and recording medium

There is disclosed an improved leak checking method which can accurately test a sealing performance of a substrate holder more than conventional leak check techniques. The leak checking method includes: holding a substrate with a substrate holder, the substrate holder including a first holding member and a second holding member, the second holding member having an opening through which a surface of the substrate is exposed; pressing a sealing projection of the second holding member against the surface of the substrate when holding the substrate with the substrate holder; covering the surface of the substrate, exposed through the opening, and the sealing projection with a sealing cap; forming a hermetic space between the sealing cap and the substrate holder; introducing a pressurized gas into the hermetic space; and detecting a decrease in pressure of the pressurized gas in the hermetic space.

Leak checking method, leak checking apparatus, electroplating method, and electroplating apparatus

A substrate holder according to the present invention comprises a first power supply member and a second power supply member which allow power to be supplied to substrates having different properties. The first power supply member comprises a first power supply member end part which extends toward the inside of a substrate holding surface and is disposed at a first position of the substrate holding surface. The second power supply member comprises a second power supply member end part which extends toward the inside of the substrate holding surface and is disposed at a second position of the substrate holding surface. The first position is located on the center side of the substrate holding surface relative to the second position.

Substrate holder, plating apparatus, and plating method

To provide an anode holder and a plating apparatus including the same, the anode holder being configured to prevent additives and black films from spreading by moving between an internal space in which an anode is provided and an external space. An anode holderaccording to the present invention includes: an internal spacethat houses an anode therein; a diaphragm configured so as to cover a front face of the internal space; a holethat is formed on an external surface of the anode holder and which communicates with the internal space; and a valvethat seals the holeshut.

Anode holder and plating apparatus

A substrate holder for holding a substrate, such as a wafer, is disclosed. The substrate holder includes a seal ring which can be brought into contact with a peripheral portion of the substrate, a support ring supporting the seal ring, and a fixing ring pressing the seal ring against the support ring. The fixing ring includes an annular portion having an inner circumferential surface and an outer circumferential surface, each of which is constituted by a tapered surface. The fixing ring further includes a seal-ring pressing portion connected to the annular portion, and a regulation ring projecting radially inwardly from the seal-ring pressing portion. The regulation ring has an inside diameter which is smaller than an inside diameter of the seal ring.

Substrate holder and plating apparatus

There is disclosed a plating apparatus which can dispose an anode, a substrate and a regulation plate parallel to each other in such a manner that the center of the anode, the center of the substrate and the center of an opening of the regulation plate are aligned in a straight line. A frame of the plating apparatus includes: a support for supporting upper portions of an anode holder, a substrate holder and the regulation plate; a box structure secured to the support; an upper positioning structure for fixing a relative position between the support and the upper portions of the anode holder, the substrate holder and the regulation plate; and a lower positioning structure for fixing a relative position between the box structure and lower portions of the anode holder, the substrate holder and the regulation plate.

Plating apparatus

A substrate plating apparatus is disclosed. The apparatus includes a substrate holder; a plating bath configured to plate a surface of the substrate in a plating solution; a cleaning bath configured to clean the substrate holder and the substrate with a cleaning liquid; an inner shell disposed in the cleaning bath and configured to house the substrate holder holding the substrate therein; and a cleaning liquid supply conduit configured to supply a cleaning liquid into the inner shell to clean the substrate, together with the substrate holder, with the cleaning liquid. The inner shell has an inner surface having an uneven configuration that follows an uneven exterior configuration of the substrate holder holding the substrate.

Substrate plating apparatus and substrate plating method

Electrical contact for use in a plating apparatus

Disclosed is a network game system that allows a plurality of players to enter a network game without imposing a lot of load on a server apparatus for managing the entire progress of the network game. A game is played in different battle zones, and video game apparatuses which play the game in the same battle zone form each of video game apparatus groups. A server apparatus designates one of the video game apparatuses belonging to each of the video game apparatus groups as a front end server. The video game apparatus designated as the front end server controls decision of motions of non-player characters, calculation of change values of parameters of player characters, and transmission/reception of information regarding the progress of the game between the video game apparatuses belonging to each of the video game apparatus groups in a unified manner. Transmission of information regarding the progress state of the game in each battle zone to the server apparatus is performed in a unified manner. Designation of the front end server is changed for every predetermined time.

Growing community of inventors

Tokyo, Japan

Masaaki Kimura