Toyota Motor Corporation

Tokyo Diamond Tools Mfg. Co., Ltd.

Masaaki Kenmochi

Yuji Yoshida

Sumio Kamiya

Yoshiaki Tashiro

Noboru Otake

Hiroshi Eda

Hisao Iwase

Libo Zhou

Teruki Yamashita

A synthetic grinding stone used for the polishing of a silicon wafer is composed of a structure containing cerium oxide fine particles as abrasive grains, a resin as a binder, a salt as a filler and a nano diamond as an additive. This synthetic grinding stone is characterized in that the purity of the cerium oxide is not less than 60% by weight, the content of the salt as a filler is not less than 1% but not more than 20%, the volume content of the nano diamond as an additive is not less than 0.1% but less than 20% relative to the total volume of the structure, and the porosity as the volume fraction relative to the total volume of the structure is less than 30%.

Synthetic grinding stone

Growing community of inventors

Tokyo, Japan

Masaaki Kenmochi