Kabushiki Kaisha Toshiba

Toshiba Memory Corporation

Masaaki Hirakawa

Ikuo Uematsu

Katsuhiro Sato

Kayoko Oomiya

Junichi Igarashi

Yukako Murakami

Yoshihiro Ogawa

Hideaki Hirabayashi

Takahiro Terada

Takeshi Yamauchi

Tomohiro Takase

Ichiro Tono

Isamu Nitta

Yoshinori Kitamura

Isao Nawata

Takaaki Wada

Shingo Kasai

Tadahiro Nakayama

Kaori Deura

Yuji Hashimoto

Emi Matsui

Takahiro Kanai

According to one embodiment, an etching solution is provided. The etching solution is used for etching of silicon nitride. The etching solution includes: phosphoric acid; tetrafluoroboric acid; a silicon compound; water; and at least one of sulfuric acid and an ionic liquid.

Etching solution, additive, and etching method

According to one embodiment, an etching solution used for etching of silicon nitride is provided. The etching solution includes phosphoric acid, an acid, silicic acid compound, and water. The phosphoric acid has a first acid dissociation exponent pK. The acid has an acid dissociation exponent smaller than the first acid dissociation exponent pK. A mass ratio M/Mof mass Mof the phosphoric acid to mass Mof the acid having the acid dissociation exponent smaller than the first acid dissociation exponent pKis within a range of 0.82 or more and 725 or less.

Etching solution, etching method, and method for manufacturing an electronic component

A method of manufacturing a semiconductor device including attaching, by a liquid treatment, a first liquid to a surface of a semiconductor substrate having a fine pattern formed therein; substituting the first liquid attached to the surface of the semiconductor substrate with a solution, the solution comprising a sublimate dissolved in a second liquid; vaporizing the second liquid and precipitating the sublimate to the surface of the semiconductor substrate to forma solid precipitate comprising the sublimate; and removing the precipitate by sublimation. For example, the sublimate may be a material having at least two carboxyl groups bonded to cyclohexane or a material formed of two carboxyl groups bonded to benzene with the bonding sites of the two carboxyl groups being adjacent to one another.

Method of manufacturing semiconductor device and chemical liquid

A substrate treatment apparatus according to an embodiment includes a treatment part, a cyclic path, a heater, and a first injector. The treatment part is supplied with an etchant containing phosphoric acid and a silica deposition suppressor, and brings a substrate having a silicon nitride film on a surface thereof into contact with the etchant to remove the silicon nitride film from the substrate. The cyclic path circulates the etchant in the treatment part. The heater heats the etchant. The first injector is provided on the cyclic path, and injects the silica deposition suppressor into the etchant.

Substrate treatment apparatus, substrate treatment method, and etchant

According to one embodiment, a treatment apparatus includes a dialysis unit, a treatment unit and a recovery unit. The dialysis unit is configured to dialyze a solution including a phosphoric acid, a silicon compound, and water. The treatment unit is configured to perform treatment of an object to be treated using a dialyzed solution. The recovery unit is configured to recover a solution used in the treatment of the object to be treated and supply to the dialysis unit. The dialysis unit includes a transmission part which allows anions to be transmitted. The recovery unit supplies the solution used in the treatment of the object to be treated, to a region in the dialysis unit. The region is divided by the transmission part.

Treatment apparatus and method for reusing treatment liquid

A method of manufacturing a semiconductor device including attaching, by a liquid treatment, a first liquid to a surface of a semiconductor substrate having a fine pattern formed therein; substituting the first liquid attached to the surface of the semiconductor substrate with a solution, the solution comprising a sublimate dissolved in a second liquid; vaporizing the second liquid and precipitating the sublimate to the surface of the semiconductor substrate to form a solid precipitate comprising the sublimate; and removing the precipitate by sublimation. For example, the sublimate may be a material having at least two carboxyl groups bonded to cyclohexane or a material formed of two carboxyl groups bonded to benzene with the bonding sites of the two carboxyl groups being adjacent to one another.

Method of manufacturing semiconductor device

According to one embodiment, a measuring system using an optical waveguide is provided. The measuring system has an optical waveguide, magnetic fine particles, a magnetic field applying unit, a light source and a light receiving element. The optical waveguide has a sensing area to which first substances having a property of specifically bonding to subject substances to be measured are fixed. Second substances having a property of specifically bonding to the subject substances are fixed to the magnetic fine particle. The magnetic field applying unit generates a magnetic field for moving the magnetic fine particles. The light source inputs a light into the optical waveguide. The light receiving element receives the light output from the optical waveguide.

Measuring system using optical waveguide, measuring device, measuring method, optical waveguide type sensor chip, and magnetic fine particle

An optical glucose sensor chip includes a substrate, a pair of optical elements formed on a surface of the substrate for introducing light into the substrate and for emitting the light from the substrate, and a glucose sensing membrane formed on the surface of the substrate at a position between the optical elements. The sensing membrane includes a color reagent substrate, a first enzyme which oxidizes or reduces glucose, a second enzyme that generates a material which makes the color reagent substrate exhibit color by a reaction with a product obtained by oxidation or reduction of glucose, a nonionic cellulose derivative, and an ionic polymer into which a buffer is incorporated. At least one of the first and second enzymes is coated with the ionic polymer, and the color reagent substrate. The first and second enzymes, the buffer and the ionic polymer are supported by the nonionic cellulose derivative.

Optical glucose sensor chip and method of manufacturing the same

Growing community of inventors

Yokohama, Japan

Masaaki Hirakawa