Jsr Corporation

Masaaki Hanamura

Atsushi Kumano

Michinori Nishikawa

Nobuo Bessho

Yasuaki Yokoyama

Hideaki Takase

Shinji Shiraki

Tomohiko Sakurai

Daigo Ichinohe

It is an object of the present invention to improve the curability of a resin composition and a photosensitive composition suitably employed to form e.g., a surface protecting film and an interlaminar insulating film of e.g., an electronic part, while reducing the internal stress remaining in a substrate when the composition is used to form a cured film on the substrate. The photosensitive composition includes a resin (A) having a phenolic hydroxyl group, a crosslinking agent (B1) having at least two oxazoline groups and a crosslinking agent (B2) having at least two groups represented by &#x2014;CHOR (wherein R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an acetyl group) and a photosensitive acid-generating agent (C).

Photosensitive composition, cured film and production process thereof, and electronic part

The present invention provides a positive-type radiation-sensitive composition containing (A) a siloxane polymer, and (B) a quinone diazide compound, in which the content of aryl groups relative to Si atoms in the siloxane polymer (A) is greater than 60% by mole and no greater than 95% by mole. 

Positive-type radiation-sensitive composition, cured film, interlayer insulating film, method of forming interlayer insulating film, display device, and siloxane polymer for forming interlayer insulating film

There is provided a method for forming a pattern comprising two regions of different refractive indices easily, that is, a method comprising the steps of forming a pattern having a water-shedding oil-shedding region by use of a radiation sensitive resin composition and coating the pattern with a high refractive index resin solution using a solvent having low wettability to the water-shedding oil-shedding region so as to form two regions of different refractive indices.

Method for forming pattern, and optical element

A radiation sensitive composition containing inorganic oxide particles; a copolymer of at least one unsaturated compound selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic anhydride and other unsaturated compound different from the unsaturated compound; a polyfunctional unsaturated compound having at least two ethylenically unsaturated groups in the molecule; and a radiation sensitive polymerization initiator. The composition is useful for making a microlens.

Radiation sensitive composition, microlens, process for forming microlens and use of the microlens

There is provided a radiation sensitive refractive index changing composition containing an inorganic oxide particle, a polymerizable compound, a radiation sensitive decomposer and an escapable compound. The radiation sensitive decomposer decomposes upon exposure to radiation to form an acid, base or radical, and this decomposed product increases the molecular weight of the polymerizable compound.

Radiation sensitive refractive index changing composition, pattern forming method and optical material

The present invention relates to a method of temporarily and firmly fixing two solids to each other and to a composition used in the method, which is a method of temporarily fixing, comprising temporarily fixing the two solids to each other with a liquid crystal compound or a composition comprising the liquid crystal compound. This method is used for a method of temporarily fixing a pad for chemical mechanical polishing, for example, to polish a wafer for a semiconductor device fixed on a surface of a base plate, when one solid is a pad for chemical mechanical polishing of a wafer for a semiconductor device and the other is a base plate to fix the pad.

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Tokyo, Japan

Masaaki Hanamura