Screen Holdings Co., Ltd.

Masaaki Furukawa

Masashi Kanaoka

Hidetoshi Sagawa

Masanori Imamura

Yoshinori Tawaratani

A substrate is held and rotated in a horizontal attitude by a rotation holder. A coating liquid is supplied by a coating liquid supplier to a surface to be processed of the substrate rotated by the rotation holder. A first removal liquid is supplied by a first removal liquid supplier to a first annular region at a peripheral portion of the substrate rotated by the rotation holder before the coating liquid supplied by the coating liquid supplier loses fluidity. In this state, a supply position of the first removal liquid by the first removal liquid supplier is moved from an inner edge to an outer edge of the first annular region.

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Kyoto, Japan

Masaaki Furukawa