Asml Netherlands B.v.

Martinus Wilhelmus Van Den Heuvel

Nicolaas Rudolf Kemper

Michel Riepen

Cornelius Maria Rops

Marcus Martinus Petrus Adrianus Vermeulen

Johannes Christiaan Leonardus Franken

Jimmy Matheus Wilhelmus Van De Winkel

Paul Petrus Joannes Berkvens

Robertus Nicodemus Jacobus Van Ballegoij

Christophe De Metsenaere

Josephus Cornelius Johannes Antonius Vugts

Josephus Cornelis Johannes Antonlus Vugts

An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

Fluid extraction system, lithographic apparatus and device manufacturing method

A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture.

Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system

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Martinus Wilhelmus Van Den Heuvel