Asml Netherlands B.v.

Martinus Maassen

Ehud Shaked

Johannes Matheus Marie De Wit

Henricus Martinus Johannes Van De Groes

Anko Jozef Cornelus Sijben

Kim Gerard Feijen

Systems and methods for conducting charged particle beam modulation are disclosed. According to certain embodiments, a charged particle beam apparatus generates a plurality of charged particle beams. A modulator may be configured to receive the plurality of charged particle beams and generate a plurality of modulated charged particle beams. A detector may be configured to receive the plurality of modulated charged particle beams.

Systems and methods for charged particle beam modulation

Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

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San Francisco, CA, United States of America

Martinus Maassen