Asml Netherlands B.v.

Martinus Joseph Kok

Sander Kerssemakers

Olav Johannes Seijger

Mark Johannes Magielsen

Henricus Wilhelmus Maria Van Buel

Reinder Teun Plug

Kim Gerard Feijen

An inspection apparatus (for example a scatterometer) comprises: a substrate support for supporting a substrate and an optical system. An illumination system illuminates a target (T) with radiation. A positioning system () moves one or both of the optical system and the substrate support so as to position an individual target (T) relative to the optical system so that the imaging optics can use a portion of the diffracted radiation to form an image of the target structure on an image sensor (). A liquid lens () is controlled () by feed-forward control to maintain said image stationary against vibration and/or scanning movement between the optical system and the target structure. In a second aspect, a liquid lens () to correct chromatic aberration during measurements made at different wavelengths. This may improve focusing of the illumination on the target (T), and/or focusing of an image on the image sensor ().

Inspection apparatus for measuring properties of a target structure, methods of operating an optical system, method of manufacturing devices

A substrate support, configured to support a substrate during a process within a lithography system, includes a lifting structure configured to move the substrate between a first position, in which a lifting face of the lifting structure supports the substrate at a position set apart from a support surface of the substrate support, and a second position, in which the lifting structure does not prevent the substrate from being supported by a support surface of the substrate support; wherein, in moving between the first and second positions, the substrate moves in a combination of movement substantially perpendicular to a plane parallel to the support surface and movement substantially parallel to the support surface.

Support structure, inspection apparatus, lithographic apparatus and methods for loading and unloading substrates

A substrate table positioning device that is supported by four bearing elements is provided. The substrate table positioning device also includes a balance mass. Two of the bearing elements support the base frame in such a way that they can move in a vertical direction independently of the other bearing elements. This can be achieved by using a hinge. This structure of substrate table positioning device has a higher lowest Eigen frequency of oscillation than that of substrate table positioning devices supported by three bearing elements. As such, the balance mass is not excited by typical vibrations that occur in the lithographic apparatus. This enables better positional control of the substrate table. It also enables at least some of the dimensions of the frame elements of the balance mass to be reduced.

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

An inspection apparatus for measuring a property of a substrate (W), includes a base frame, a substrate table () to hold the substrate, an illumination system arranged to direct a beam of radiation onto the substrate and a sensor arranged to detect radiation reflected off the substrate. Two balanced positioning systems displace the substrate table and sensor relative to the base frame in several directions. Each balanced positioning system includes a balance mass (), a bearing arrangement () to movably support the balance mass and tracks effective to guide the displacement in each direction. A motor arrangement causes the displacement in each direction. The balance mass is positioned relative to the track arrangement such that the centers of gravity of each balance mass and the substrate table or the sensor are substantially aligned in the direction substantially perpendicular to the plane including the direction of displacement.

Inspection method and apparatus

To inspect all portions of the substrate the substrate table can be moved rotationally and linearly. Furthermore the detector can be moved rotationally. This enables all portions of a surface of the substrate to be inspected from all angles in a plane parallel to the substrate. Less linear motion is needed, so the apparatus occupies a smaller volume and generates smaller vibrations.

Apparatus for angular-resolved spectroscopic lithography characterization

To inspect all portions of the substrate, the substrate table can be moved rotationally and linearly. Furthermore, the detector can be moved rotationally. This allows all portions of a surface of the substrate to be inspected from all angles in a plane parallel to the substrate. In one example, as less linear motion is needed, the apparatus occupies a smaller volume and generates smaller vibrations.

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Eindhoven, Netherlands

Martinus Joseph Kok