Asml Netherlands B.v.

Martinus Hendricus Henricus Hoeks

Arno Jan Bleeker

Theodorus Petrus Maria Cadee

Hans Butler

Patricius Aloysius Jacobus Tinnemans

Koen Jacobus Johannes Maria Zaal

Harmen Klaas Van Der Schoot

Marc Wilhelmus Maria Van Der Wijst

Sven Antoin Johan Hol

Ruud Antonius Catharina Maria Beerens

Bernardus Antonius Slaghekke

Wilhelmus Henricus Theodorus Maria Aangenent

Pieter Renaat Maria Hennus

Niels Johannes Maria Bosch

Olof Martinus Josephus Fischer

There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target.

Lithography apparatus, a device manufacturing method, a method of manufacturing an attenuator

A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.

Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method

An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Breugel, Netherlands

Martinus Hendricus Henricus Hoeks