Asml Netherlands B.v.

Martinus Hendricus Hendricus Hoeks

Lambertus Gerardus Maria Kessels

Patricius Aloysius Jacobus Tinnemans

Dominicus Jacobus Petrus Adrianus Franken

Bob Streefkerk

Joost Jeroen Ottens

Arno Jan Bleeker

Pieter Willem Herman De Jager

Wilhelmus Josephus Box

Kars Zeger Troost

Huibert Visser

Erwin John Van Zwet

Borgert Kruizinga

Henricus Gerardus Tegenbosch

Roeland Nicolaas Maria Vanneer

Marcus Gerhardus Hendrikus Meijerink

Theodorus Leonardus Van Den Akker

Marco Cornelis Jacobus Martinus Van Hassel

Nicolaas Cornelis Johannes Van Der Valk

Har Van Himbergen

Frank Anton Morselt

Tobrjörn Sandström

Arno Jano Bleeker

Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.

SLM calibration

A lithography apparatus with a data-path for converting a representation of a requested dose pattern to a sequence of control data suitable for controlling an array of individually controllable elements. The data path comprises a plurality of data manipulation devices and a calculation load controller for balancing a calculation load between the data manipulation devices. A device manufacturing method using elements of the lithography apparatus, and a flat panel display and integrated circuit device manufactured using the method.

Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load

A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method includes generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.

Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume

A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus.

Lithographic apparatus and device manufacturing method

A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.

A lithographic projection apparatus is provided with an electrostatic chuck. The electrostatic chuck includes a dielectric element which has a plurality of pins formed on a first surface. The item to be clamped is clamped in position on the chuck by applying a potential difference between an electrode located on the surface of the dielectric member opposite to the clamping surface and an electrode located on the clamping surface of the item to be clamped. The pins are provided with at least an upper conducting layer, which serves to reduce the Johnsen-Rahbek effect, allowing the substrate to be released more quickly.

Chuck, lithographic apparatus and device manufacturing method

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Breugel, Netherlands

Martinus Hendricus Hendricus Hoeks