Asml Netherlands B.v.

Asml Holding N.v.

Martinus Agnes Willem Cuijpers

Christiaan Alexander Hoogendam

Hans Butler

Adrianus Hendrik Koevoets

Alain Louis Claude Leroux

Joost Jeroen Ottens

Franciscus Johannes Joseph Janssen

Frits Van Der Meulen

Jan Bernard Plechelmus Van Schoot

Marc Wilhelmus Maria Van Der Wijst

Han-Kwang Nienhuys

Leon Martin Levasier

Yuri Johannes Gabriël Van De Vijver

Michael Jozef Mathijs Renkens

Robertus Leonardus Tousain

Marcio Alexandre Cano Miranda

Maurice Willem Jozef Etiënne Wijckmans

Danny Maria Hubertus Philips

Robertus Johannes Marinus De Jongh

Robertus Nicodemus Jacobus Van Ballegoij

Manish Ranjan

Roger Wilhelmus Antonius Henricus Schmitz

Oleg Voznyi

Albert Pieter Rijpma

Kursat Bal

Oleksiy Galaktionov

Ronald Cornelis Gerardus Gijzen

Ronald Petrus Hendricus Faassen

Erik Roelof Loopstra

Nicolaas Ten Kate

Martinus Hendrikus Antonius Leenders

Engelbertus Antonius Fransiscus Van Der Pasch

Raymond Wilhelmus Louis Lafarre

Henrikus Herman Marie Cox

Harmen Klaas Van Der Schoot

Theodorus Petrus Maria Cadee

Peter Conrad Kochersperger

David Ferdinand Vles

Wilhelmus Franciscus Johannes Simons

Ruud Antonius Catharina Maria Beerens

Gosse Charles De Vries

Frederik Eduard De Jong

Laurentius Johannes Adrianus Van Bokhoven

Roberto B Wiener

Jim Vincent Overkamp

Sander Catharina Reinier Derks

Martijn Houkes

Jan Jaap Kuit

Willem Herman Gertruda Anna Koenen

Peter Smits

Frank Auer

Gerardus Adrianus Antonius Maria Kusters

Gerardus Petrus Matthijs Van Nunen

Sebastiaan Maria Johannes Cornelissen

Fransiscus Mathijs Jacobs

Koos Van Berkel

Martin Frans Pierre Smeets

Christiaan Louis Valentin

Edwin Augustinus Matheus Van Gompel

Hendrikus Herman Marie Cox

Jacobus Cornelis Gerardus Van Der Sanden

Martijn Van Baren

Rob Jansen

Menno Fien

Stan Henricus Van Der Meulen

Evert Hendrik Jan Draaijer

Edwin Teunis Van Donkelaar

Marcus Joseph Elisabeth Godfried Breukers

Pieter Johannes Gertrudis Meijers

Cornelis Christiaan Ottens

Patrick Willem Paul Limpens

Dries Vaast Paul Hemschoote

Erik Johan Arlemark

Johannes Antonius Maria Van De Wal

Joost De Hoogh

Martinus Godefridus Helena Boogaarts

Boris Kogan

Robert Jeffrey Wade

Bart Friso Riedstra

Maurice Wijckmans

Maikel Cornelis Andreas Bruin

Paul Comé Henri De Wit

Shaun Evans

Evert Auke Rinze Westerhuis

Johannes Antonius Mria Van De Wal

Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.

Reticle gripper damper and isolation system for lithographic apparatuses

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Lithographic apparatus, device manufacturing method and displacement measurement system

A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

Positioning system, lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting location at or near the center of the panel-shaped body to mount the leaf spring to a first of the two objects, wherein the leaf spring includes one or more second mounting locations at or near the circumference of the panel-shaped body to mount the leaf spring to the second of the two objects, and elongate grooves and/or slits in the panel shaped body between the first mounting location and the second mounting location, the grooves and/or slits running in at least two non-orthogonal directions in the plane of the two orthogonal directions.

Leaf spring, stage system, and lithographic apparatus

A lithographic apparatus is disclosed in which a circular sensor is mounted to a substrate table with three leaf springs that are evenly spaced around a thermal axis of the sensor. The leaf springs are provided in two parts that are releasably attachable to each other. The leaf springs are elastic and allow some movement of the sensor relative to the substrate table on thermal expansion and contraction but ensure that the thermal center of the sensor does not move relative to the substrate table.

Lithographic apparatus with mounted sensor

A moveable object carrier is moveable in a first direction and in a second direction to be positioned in a plane. The object carrier may be moved in the first direction by a first and a second linear actuator. The first and second linear actuators are adapted to support the object carrier. Thereto the linear actuators may comprise additional bearing and the linear actuators are positioned relative to the object carrier such that no other bearing is required to prevent the object carrier from falling or tilting. The object carrier may be moved in the second direction by a third and a fourth linear actuator, which linear actuators may be adapted to support the first and the second linear actuators.

Moveable object carrier, lithographic apparatus comprising the moveable object carrier and device manufacturing method

A lithographic projection apparatus is presented, which includes a housing, which comprises therein a first exposure system that has at least one movable part (e.g. a movable first substrate holder or a movable second substrate holder in a twin stage apparatus). The apparatus also includes a position disturbance correction system for correcting a position of the first substrate holder with respect to the patterned projection beam due to the influence of gas pressure differences or gas movements, caused by movements of the movable part. A related device manufacturing method is also presented in which, during the exposure of a first substrate, the position thereof is corrected by means of position disturbance correction system.

Lithographic apparatus with disturbance correction system and device manufacturing method

A lithographic apparatus that includes an exposure system and a measurement system, is presented. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.

A substrate holder has burls having a height not less than 100 &#x3bc;m and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the substrate. Thereby concave wafers can be reliably clamped by generating an initial vacuum in a central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen until the wafer is fully clamped.

Lithographic apparatus, device manufacturing method and substrate holder

A supporting assembly for use in a lithographic projection apparatus includes a moveable member which is journalled in a housing such that substantially no vibration forces are transmitted between the moveable member and the housing. The assembly comprises a gas filled pressure chamber in which the gas in the pressure chamber acts on the moveable member so as to at least partially counteract the force due to the weight of the moveable member and any other object which it carries. The pressure chamber is supplied with gas and the whole assembly is constructed and arranged such that substantially no gas flows through the pressure chamber when the moveable member is substantially stationary. The supporting assembly may be applied to a lithographic projection apparatus, object table, or metrology frame.

Lithographic projection apparatus, supporting assembly and device manufacturing method

Growing community of inventors

Veldhoven, Netherlands

Martinus Agnes Willem Cuijpers