Forschungszentrum Karlsruhe Gmbh

Karlsruher Institut Fur Technologie

Other

Iowa State University Research Foundation, Inc.

University of Toronto

Carl Zeiss Vision International Gmbh

Humboldt-Universität Zu Berlin

Universität Karlsruhe

Martin Wegener

Geoffrey Alan Ozin

Georg Von Freymann

Michael Totzeck

Daniel Christoph Meisel

Matthias Hillenbrand

Joachim Fischer

Matthias Blaicher

Costas M Soukoulis

Wolfram Pernice

Thomas Koschny

Martin Hermatschweiler

Andreas Schell

Oliver Benson

Bernd Borrmann

Roman Zvahelskyi

Marc Frederik Mayer

Guillaume Gomard

Eva Blasco

Patrick Müller

Sean H Wong

Vincent Hahn

Iouri Mikliaev

Markus Deubel

Georg Ludwig Eberhard Von Freymann

Sean Wong

Alexandra Ledermann

Johannes Kaschke

Jigang Wang

Liang Luo

Marc Frederic Mayer

Andreas Schelll

Nicolas Tetreault

Martin Hermatschweller

A 3D printing apparatus for manufacturing a workpiece has a first radiation source to carry out a non-linear absorption polymerization and a second radiation source to carry out optical coherence tomography. A first beam path is traversed by the first radiation and a second beam path is traversed by the second radiation. The first and second beam paths are formed completely independently of one another. Further, a 3D printing method for manufacturing a workpiece, another 3D printing apparatus, and methods for analyzing the quality of a raw material of a non-linear absorption polymerization; checking an orientation of a substrate to be printed by non-linear absorption polymerization; determining a spatially resolved degree of conversion of a non-linear absorption polymerization; analyzing a structural sharpness of a structure produced by non-linear absorption polymerization; and for three-dimensional reconstruction of a workpiece manufactured by non-linear absorption polymerization are disclosed.

3D printing apparatus and 3D printing method for manufacturing a workpiece

The present invention relates to a method for additive manufacturing of a 3D-structured form and to a device for additive manufacturing of a 3D-structured form.

Parallelized 3D lithography using multi-beam, multi-color light-induced polymerization

Provided are systems and methods to generate single-cycle THz pulses from a few tens of nanometers thin layer of split ring resonators (SRRs) via optical rectification of femtosecond laser pulses. The emitted THz radiation, with a spectrum ranging from about 0.1 to 4 THz, arises exclusively from pumping the magnetic-dipole resonance of SRRs around 200 THz. This resonant enhancement, together with pump polarization dependence and power scaling of the THz emission, underpins the nonlinearity from optically induced circulating currents in SRRs, with a huge effective nonlinear susceptibility of 0.8&#xd7;10m/V that far exceeds surface nonlinearities of both thin films and bulk organic/inorganic crystals and sheet nonlinearities of non-centrosymmetric materials such as ZnTe.

Broadband terahertz generation of metamaterials

The present invention is related to an integrated optical circuit, in particular, to an optical-field writable array, as well as to methods for its manufacturing and reconfiguring. The integrated optical circuit comprises at least one nanophotonic device and at least one photonic wire, wherein the nanophotonic device comprises a substrate equipped with at least one reception for at least one external connector, wherein the reception is coupled to at least one connector waveguide, and at least one set of nano-optic components, wherein the nano-optic component is one of a nanophotonic waveguide or a nanophotonic component, wherein the nano-photonic component is nano-optically coupled to at least one nanophotonic waveguide, wherein at least one of the nanophotonic waveguides is selectively coupleable to at least one of the connector waveguides, wherein the photonic wire connects at least one of the nanophotonic waveguides to at least one of the connector waveguides.

Integrated optical circuit and methods for its manufacturing and reconfiguring

An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of:

Methods and fabrication tools for fabricating optical devices

An optical arrangement has a laser configured to emit a laser beam, an amplitude mask and a focusing element. The amplitude mask is disposed between the laser and the focusing element in a path of the laser beam such that the laser beam hits the amplitude mask before being modified by the focusing element so as to direct the laser beam to a focal point within a photosensitive material.

Optical arrangement and its use

The invention relates to a process for producing a photonic crystal which consists of a material of high refractive index, comprising the following process steps:

Method for producing a photonic crystal

A method of using a chemical compound as an etchant for the removal of unmodified areas of a chalcogenide-based glass, while leaving the imagewise modified areas un-removed, wherein the compound contains a secondary amine, R1 R2 NH, with R1 and/or R2 having a sterically bulky group with more than 5 atoms.

Chemical etching composition for the preparation of 3-D nano-structures

The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lower than the electronic band gap of the photoresist but whose intensity at the focal point is so high that nonlinear effects occur there nevertheless results in a phase alteration in the photoresist. Thereafter, the illuminated photoresist is exposed to an etching solution which preferentially dissolves one phase of the photoresist, and the developed photoresist is finally removed therefrom as a photonic crystal. Inorganic photonic crystals produced by the process according to the invention are suitable for completely optical systems, circuits and components for optical telecommunication or computer systems.

Method for producing photonic crystals

The invention relates to a method for producing a large variety of photoresist structures, wherein a volume of photosensitive material () is exposed at least once by means of at least two light beams (), which are superposed inside the photosensitive material (), and is subsequently subjected to a developing process, wherein the light beams () penetrate at least one transparent optical element (). The optical element () is a polyhedron with planar or curved surfaces which largely prevents refraction of the light beams on the surface of the volume of photosensitive material () when the beams are fed-in and/or fed-out of the volume of photosensitive material (), so that the angle of refraction for the light beams () can be greater in the volume of photosensitive material () than the critical angle of the total reflection, which has a limiting effect without optical element ().

Method for the production of photoresist structures

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Karlsruhe, Germany

Martin Wegener