Carl Zeiss Smt Gmbh

Martin Vogt

Joachim Hartjes

Toralf Gruner

Markus Deguenther

Johannes Wangler

Ingo Saenger

Thomas Korb

Andras G Major

Olaf Dittmann

Severin Waldis

Ralf Scharnweber

Gundula Weiss

A microlithographic arrangement, for example using light in the extreme UV range, includes a supporting structure for supporting an optical unit, the mass of which can be 4 t to 14 t. The supporting structure includes a number of separate supporting units for supporting the optical unit. Each of the supporting units includes an air bearing unit by way of which a supporting force which counteracts the weight of the optical unit can be generated. The number of supporting units is at least four, at least two of the supporting units being coupled via a coupling device to form a supporting unit pair in such a way that the coupling device counteracts a deviation from a predeterminable ratio of the supporting forces of the two supporting units of the supporting unit pair.

Support of an optical unit

An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.

Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method

A facet mirror device includes a facet element, a support device and a clamping device. The facet element includes a first support section, while the support device comprises a second support section contacting the first support section to support the facet element. The clamping device includes a tensioning element, a first end of the tensioning element being connected to the facet element a second end of the tensioning element being connected to a counter unit. The counter unit includes a third support section, the support device including a fourth support section contacting the third support section to support the counter unit.

Facet mirror device

Growing community of inventors

Mutlangen, Germany

Martin Vogt