Heraeus Quarzglas Gmbh & Co Kg

Martin Thürer

Martin Trommer

Walter Lehmann

Described is a process for the production of synthetic fused silica in which the deposition surface is located for a period of at least 50% of the build-up time of the soot body at a burner distance in which the horizontally integrated luminous intensity of the flame of the burner used in the targetless state is still at least ⅔ of the maximum horizontally integrated luminous intensity of the flame.

Process for the preparation of synthetic quartz glass

Described is a method of producing synthetic fused silica in which the synthetic flame used in the method has a ratio of the Full Width at Half Maximum (FWHM) vertical luminous intensity to the Full Width at Half Maximum (FWHM) horizontal luminous intensity greater than 10 in a targetless state, the luminous intensities being measured in candela/mm.

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Bitterfeld-Wolfen, Germany

Martin Thürer