Other

University of California

Institut Fur Mikrotechnik Mainz Gmbh

Martin Schmidt

Thomas Zetterer

Antoni Picard

Michel Neumeier

P James Schuck

Deirdre Olynick

Klaus-Peter Kamper

Jane Schulze

A novel approach to dry development of exposed photo resist is described in which a photo resist layer is exposed to a visible light source in order to remove the resist in the areas of exposure. The class of compounds used as the resist material, under the influence of the light source, undergoes a chemical/structural change such that the modified material becomes volatile and is thus removed from the resist surface. The exposure process is carried out for a time sufficient to ablate the exposed resist layer down to the layer below. A group of compounds found to be useful in this process includes aromatic calixarenes.

Lithographic dry development using optical absorption

The invention relates to an optical switching element for altering the propagation direction of at least one light beam, comprising a transparent base body ( ), said base body being provided with a recess ( ) for forming at least one boundary surface ( ) between an optically denser medium and an optically more translucent medium. The incident light strikes this boundary surface ( ). The recess ( ) is filled partly with a liquid ( ) and contains a moveable body ( ). The liquid ( ) and the moveable body ( ) have approximately the same refractive index as the transparent base body. To switch the switching element ( ) to a transmitting switching state, the moveable body is positioned in the recess in such a way that the gap between the boundary surface and the surface of the moveable body is filled completely with the liquid. If the moveable body is positioned in the recess in such a way that the boundary surface is free of the liquid, the incident light is reflected on said boundary surface. The switching element has low optical damping and is therefore economical to produce. Its compact construction means that larger switching arrangements with a large number of optical inputs and outputs can be created with the switching element.

Optical switching element and switching arrangement

An X-ray radiolucent material consisting of a beryllium substrate and a protective coating connected to the substrate is produced by applying a protective coating comprised of at least one component selected from the group consisting of silicon oxide, silicon nitride, silicon carbide, and amorphous carbon. Preferably, a CVD process or sputtering is used to apply the protective coating.

X-ray radiolucent material, method for its manufacture, and its use

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Berlin, Germany

Martin Schmidt