Micronic Laser Systems Ab

Teledyne Signal Processing Devices Sweden Ab

Mycronic Ab

Martin Olsson

Torbjörn Sandström

Per Elmfors

Stefan Gustavson

Mats Rosling

Torbjorn E Sandstrom

Per Löwenborg

Leif Odselius

Mikael Kent Gustavsson

Frida Bref

Frida Eng

Mikael Gustavsson

Each realization of an electric circuit design defines a frequency response. For a test lot of the design, frequency responses are measured, each at a stable value of an environment parameter, wherein the totality of the values are distributed over a parameter range. Based on the measurements, a design-specific model is defined that describes a frequency response of the design in dependence of the environment parameter. For a unit in a main lot of realizations of the design, a unit-specific frequency response is measured at a stable value of the environment parameter; the model is fitted to the response, whereby a unit-specific model is obtained; data representing the unit-specific model is stored in association with the unit; and the unit is operated in conjunction with a compensation stage configured to determine a present value of the environment parameter and compensate drift in relation to a parameter-independent reference frequency response.

Drift compensation

The invention relates to production and precision patterning of work pieces, including manufacture of photomask for photolithography and direct writing on other substrates, such as semiconductor substrates. In particular, it relates to applying corrections to pattern data, such as corrections for distortions in the field of an SLM exposure stamp. It may be used to produce a device on a substrate. Alternatively, the present invention may be practiced as a device practicing disclosed methods or as an article of manufacture, particularly a memory, either volatile or non-volatile memory, including a program adapted to carry out the disclosed methods.

Method and device for correcting SLM stamp image imperfections

The present invention includes a method to use a phase modulating micromirror array to create an intensity image that has high image fidelity, good stability through focus and good x-y symmetry. Particular aspects of the present invention are described in the claims, specification and drawings.

Graphics engine for high precision lithography

The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.

Method and device for data integrity checking

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Linköping, Sweden

Martin Olsson